Abstract:Semiconductor imaging and analysis are critical yet understudied in deep learning, limiting our ability for precise control and optimization in semiconductor manufacturing. We introduce a small-scale multimodal framework for analyzing semiconductor electron microscopy images (MAEMI) through vision-language instruction tuning. We generate a customized instruction-following dataset using large multimodal models on microscopic image analysis. We perform knowledge transfer from larger to smaller models through knowledge distillation, resulting in improved accuracy of smaller models on visual question answering (VQA) tasks. This approach eliminates the need for expensive, human expert-annotated datasets for microscopic image analysis tasks. Enterprises can further finetune MAEMI on their intellectual data, enhancing privacy and performance on low-cost consumer hardware. Our experiments show that MAEMI outperforms traditional methods, adapts to data distribution shifts, and supports high-throughput screening.

What problem does this paper attempt to address?

### What problems does this paper attempt to solve? This paper aims to solve several key challenges in electron micrograph analysis in the semiconductor manufacturing process, specifically including: 1. **Limitations in high - precision control and optimization**: Semiconductor imaging and analysis are under - researched in the field of deep learning, which limits our ability to precisely control and optimize the semiconductor manufacturing process. Existing technologies struggle to meet the requirements of nanometer - level precision, especially in material characterization. 2. **Scarcity of high - quality data**: Obtaining high - quality training datasets is crucial for customizing small - scale multimodal models (SMMs), but these datasets are often scarce and expensive. The annotation process requires expertise and tools, is time - consuming and resource - intensive. 3. **Privacy and security issues**: When using large multimodal models (LMMs), enterprises are worried that sharing sensitive information with third - party services will expose their designs and processes, thus harming intellectual property rights and endangering future innovation. Therefore, a method that can be fine - tuned on the enterprise's internal infrastructure is needed to enhance privacy and security. 4. **Generalization and interpretability of small - scale models**: Although small - scale multimodal models are more cost - effective and easier to customize, they may not be as good as large - scale proprietary models in terms of generalization ability and interpretability. In addition, they may have limitations when dealing with complex multimodal inputs. To solve these problems, the paper introduces a small - scale multimodal framework named "MAEMI (Multimodal Assistant for Electron Micrograph Analysis)". Through vision - language instruction tuning, MAEMI can analyze semiconductor electron micrographs and generate high - quality image - question - answer pairs without relying on manually - annotated data. This method not only improves the performance of small - scale models but also reduces computational requirements and enhances privacy protection and security. Specifically, MAEMI solves problems in the following ways: - **Knowledge distillation**: Extract knowledge from large models and transfer it to small models to improve the accuracy and generalization ability of small models. - **Automatically generate training data**: Utilize large pre - trained multimodal models to generate high - quality instruction - following data, avoiding the dependence on manually - annotated data. - **In - house fine - tuning by enterprises**: Allow enterprises to further fine - tune the model on their own data to ensure data privacy and security. Through these methods, MAEMI can better handle complex multimodal input tasks, such as image caption generation and open - ended visual question answering (VQA), and performs well on multiple evaluation metrics.

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