Fabrication Tolerant Multi-Layer Integrated Photonic Topology Optimization

Michael J. Probst,Arjun Khurana,Joel B. Slaby,Alec M. Hammond,Stephen E. Ralph
2024-04-10
Abstract:Optimal multi-layer device design requires consideration of fabrication uncertainties associated with inter-layer alignment and conformal layering. We present layer-restricted topology optimization (TO), a novel technique which mitigates the effects of unwanted conformal layering for multi-layer structures and enables TO in multi-etch material platforms. We explore several approaches to achieve this result compatible with density-based TO projection techniques and geometric constraints. Then, we present a robust TO formulation to design devices resilient to inter-layer misalignment. The novel constraint and robust formulation are demonstrated in 2D grating couplers and a 3D polarization rotator.
Optics,Applied Physics
What problem does this paper attempt to address?