Characterization of pixel crosstalk and impact of Bayer patterning by quantum efficiency measurement

Jérôme Vaillant,Clémence Mornet,Thomas Decroux,Didier Hérault,Isabelle Schanen

DOI: https://doi.org/10.1117/12.879603

2024-03-20

Abstract:Development of small pixels for high resolution image sensors implies a lot of challenges. A high level of performance should be guaranteed whereas the overall size must be reduced and so the degree of freedom in design and process. One key parameter of this constant improvement is the knowledge and the control of the crosstalk between pixels. In this paper, we present an advance in crosstalk characterization method based on the design of specific color patterns and the measurement of quantum efficiency. In a first part, we describe the color patterns designed to isolate one pixel or to simulate un-patterned colored pixels. These patterns have been implemented on test-chip and characterized. The second part deals with the characterization setup for quantum efficiency. Indeed, the use of spectral measurements allows us to discriminate pixels based on the color filter placed on top of them and to probe the crosstalk as a function of the depth in silicon, thanks to the photon absorption length variation with the wavelength. In the last part, results are presented showing the impact of color filters patterning, i.e. pixels in a Bayer pattern versus un-patterned pixels. The crosstalk directions and amplitudes are also analyzed in relation to pixel layout.

Optics,Instrumentation and Detectors

What problem does this paper attempt to address?

This paper aims to solve the pixel crosstalk problem in small - pixel CMOS image sensors. With the development of high - resolution image sensors, the design of small pixels faces many challenges, one of which is how to effectively control the signal interference or crosstalk between adjacent pixels. Crosstalk not only affects image quality but also reduces the overall performance of the sensor. Therefore, understanding and quantifying the crosstalk between pixels is crucial for improving pixel design and manufacturing processes.

The paper proposes an advanced crosstalk characterization method based on specific color filter pattern design and quantum efficiency measurement. Through this method, researchers can distinguish signals from crosstalk and analyze the direction and magnitude of crosstalk at different wavelengths, thereby evaluating the impact of color filter arrangements (i.e., Bayer pattern) on crosstalk. Specifically, the paper achieves this goal through the following steps:

1. **Design specific color filter patterns**: To isolate a pixel or simulate unarranged color pixels, specific color patterns are designed and these patterns are implemented on the test chip.
2. **Quantum efficiency measurement device**: Spectral measurement is used to distinguish pixels based on their top - color filters, and crosstalk at different depths in silicon is detected by the change in photon absorption length with wavelength.
3. **Result analysis**: The crosstalk differences between Bayer - pattern pixels and non - pattern pixels are shown, and the relationship between crosstalk direction and magnitude and pixel layout is analyzed.

Through the above - mentioned methods, the paper not only provides an in - depth understanding of the crosstalk phenomenon but also provides important data support for the design optimization of future small - pixel CMOS image sensors.