Pushing the Pareto front of band gap and permittivity: ML-guided search for dielectric materials

Janosh Riebesell,T. Wesley Surta,Rhys Goodall,Michael Gaultois,Alpha A Lee
2024-01-11
Abstract:Materials with high-dielectric constant easily polarize under external electric fields, allowing them to perform essential functions in many modern electronic devices. Their practical utility is determined by two conflicting properties: high dielectric constants tend to occur in materials with narrow band gaps, limiting the operating voltage before dielectric breakdown. We present a high-throughput workflow that combines element substitution, ML pre-screening, ab initio simulation and human expert intuition to efficiently explore the vast space of unknown materials for potential dielectrics, leading to the synthesis and characterization of two novel dielectric materials, CsTaTeO6 and Bi2Zr2O7. Our key idea is to deploy ML in a multi-objective optimization setting with concave Pareto front. While usually considered more challenging than single-objective optimization, we argue and show preliminary evidence that the $1/x$-correlation between band gap and permittivity in fact makes the task more amenable to ML methods by allowing separate models for band gap and permittivity to each operate in regions of good training support while still predicting materials of exceptional merit. To our knowledge, this is the first instance of successful ML-guided multi-objective materials optimization achieving experimental synthesis and characterization. CsTaTeO6 is a structure generated via element substitution not present in our reference data sources, thus exemplifying successful de-novo materials design. Meanwhile, we report the first high-purity synthesis and dielectric characterization of Bi2Zr2O7 with a band gap of 2.27 eV and a permittivity of 20.5, meeting all target metrics of our multi-objective search.
Materials Science,Artificial Intelligence,Machine Learning,Chemical Physics
What problem does this paper attempt to address?
This paper focuses on the discovery of high dielectric constant materials widely used in electronic devices. The practical value of these materials lies in their ability to easily polarize under an external electric field, but high dielectric constants often coexist with narrow band gaps (which limit the operating voltage) leading to dielectric breakdown. The research team proposed a high-throughput workflow combining element substitution, machine learning (ML) pre-screening, initial value simulation, and human expert intuition to effectively explore the unknown material space and identify potential dielectric materials. They specifically used a multi-objective optimization approach, utilizing ML to predict materials with excellent performance even when balancing multiple conflicting properties such as band gap and dielectric constant. The research team synthesized two new dielectric materials, CsTaTeO6 and Bi2Zr2O7, using this approach. CsTaTeO6 was generated through element substitution to create a new structure, while Bi2Zr2O7 achieved high purity synthesis and dielectric characterization for the first time, with a band gap of 2.27 eV and a dielectric constant of 20.5. Experimental validation showed that these two materials partially or fully met the target indicators of the multi-objective search. The paper indicates that although ML may not be as reliable as traditional methods in single-objective optimization tasks, its application in multi-objective optimization can reduce the need for extrapolation and operate within well-supported regions, thus predicting materials with excellent performance. Furthermore, the challenges of experimental synthesis and characterization remain a key bottleneck in material design, but ML-guided screening can improve the hit rate of successful materials and reduce the risk of trying new synthesis procedures. Overall, this paper demonstrates the potential of ML in the discovery of dielectric materials, enabling efficient navigation through vast material spaces and balancing multiple material properties to achieve optimal device performance.