Abstract:In order to inspire the use of layered materials for the realization of nanophotonic structures, the dielectric response and nonlinear susceptibility of various van der Waals crystals is extracted. Nanoantennas from single and twisted stacks of multiple layered crystals are fabricated on SiO2 and gold substrates yielding Mie resonances leading to strong light‐matter coupling and high‐quality‐factor, hybrid Mie‐plasmon modes. Numerous optical phenomena and applications have been enabled by nanophotonic structures. Their current fabrication from high refractive index dielectrics, such as silicon (Si) or gallium phosphide (GaP), pose restricting fabrication challenges while metals, relying on plasmons and thus exhibiting high ohmic losses, limit the achievable applications. An emerging class of layered, so‐called van der Waals (vdW), crystals is presented as a viable nanophotonics platform in this work. The dielectric response of 11 mechanically exfoliated thin‐film (20–200 nm) vdW crystals is extracted, revealing high refractive indices up to n = 5, pronounced birefringence up to Δn = 3, sharp absorption resonances, and a range of transparency windows from ultraviolet to near‐infrared. Nanoantennas are subsequently fabricated on silicon dioxide (SiO2) and gold, utilizing the compatibility of vdW thin films with a variety of substrates. Pronounced Mie resonances are observed due to the high refractive index contrast on SiO2, leading to a strong exciton‐photon coupling regime as well as largely unexplored high‐quality‐factor, hybrid Mie‐plasmon modes on gold. Additional vdW‐material‐specific degrees of freedom in fabrication are further demonstrated by realizing nanoantennas from stacked twisted crystalline thin‐films, enabling control of nonlinear optical properties, and post‐fabrication nanostructure transfer, important for nano‐optics with sensitive materials.

Retrieving optical parameters of emerging van der Waals flakes

Thickness Mapping and Layer Number Identification of Exfoliated van der Waals Materials by Fourier Imaging Micro-Ellipsometry

Near-field refractometry of van der Waals crystals

Determining van der Waals materials' optical and polaritonic properties using cryogenic FTIR micro-spectroscopy

Fourier analysis of the IR response of van der Waals materials

Infrared Permittivity of the Biaxial van der Waals Semiconductor α-MoO3 from Near- and Far-Field Correlative Studies

Retrieving Material Permittivity Under Oblique Incidence

Infrared permittivity of the biaxial van der Waals semiconductor $α$-MoO$_3$ from near- and far-field correlative studies

Optical Parameters of Graphene/mos2 Van Der Waals Heterostructure Investigated by Spectroscopic Ellipsometry

Highly Accurate Determination of Heterogeneously Stacked Van-der-Waals Materials by Optical Microspectroscopy

Probing the Local Dielectric Function by Near Field Optical Microscopy Operating in the Visible Spectral Range

Imaging of Interlayer Coupling in van der Waals Heterostructures Using a Bright-Field Optical Microscope

Optical and geometric parameter extraction across 300-mm photonic integrated circuit wafers

Parameter-free extraction of Thin-Film Dielectric Constants from Scanning Near Field Microwave Microscope Measurements

X-ray photoelectron spectroscopy of high-throughput mechanically exfoliated van der Waals materials

Van der Waals Materials for Applications in Nanophotonics

Direct retrieval method of the effective permittivity and permeability of bulk semi-infinite metamaterials by variable-angle spectroscopic ellipsometry

Imaging and structure analysis of ferroelectric domains, domain walls, and vortices by scanning electron diffraction

Complex Permittivity Characterization of Low-Loss Dielectric Slabs at Sub-THz

Noninvasive Photodelamination of van der Waals Semiconductors for High-Performance Electronics