Photoelectric properties of large area WTe2 thin films prepared by pulsed laser deposition

Yi Xiao,Kai Luo,Qijun Kao,Yajun Fu,Wanyu Jiang,Linhong Cao
DOI: https://doi.org/10.1016/j.surfin.2023.103670
IF: 6.2
2024-01-01
Surfaces and Interfaces
Abstract:WTe2 is considered as an exceptionally desirable material for broadband photodetection. However, the controllable preparation of WTe2 with large area and high quality has become a key factor limiting its photoelectric detection. In this paper, large-area, favorable crystal quality WTe2 thin film were prepared with the size of 10 × 10 mm by pulsed laser deposition in conjunction with post-annealing on a SiO2 substrate. X-ray diffraction and Raman spectrum confirmed the crystallization quality of WTe2 which referred to an orthorhombic structure. The atomic ratio of W and Te, as characterized by EDS, is approximately 1:2. The large-area WTe2 thin film, post-annealed at 400 °C, demonstrates relatively strong optoelectronic performance with a responsivity of 1.4 mA/W and a specific detectivity of 2.3 × 106 Jones. This study provide a new strategy for the large-scale preparation of WTe2 thin films by combining pulsed laser deposition and post annealing.
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films
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