β‐Gallium Oxide Devices: Progress and Outlook

Masataka Higashiwaki
DOI: https://doi.org/10.1002/pssr.202100357
2021-10-04
Abstract:Beta-gallium oxide (β-Ga2O3) has a history of research and development for over 70 years; however, it had attracted little attention as a semiconductor material for a long term. The situation has drastically changed in the past decade, and research on its material properties and developments of growth and device technologies have got active worldwide, mainly from expectations for applications to next-generation power devices. Most of the specific material properties are attributed to its extremely large bandgap energy of 4.5 eV. The other important material feature is that large-size single crystal bulks can be synthesized by melt growth methods. In this review, after introducing material properties of β-Ga2O3 that are important for electronic devices, current status of bulk melt growth and epitaxial thin-film growth technologies are given. State-of-the-art β-Ga2O3 diodes and transistors are also discussed, including future prospects.This article is protected by copyright. All rights reserved.
physics, condensed matter, applied,materials science, multidisciplinary
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