High efficiency deep-UV emission at 219 nm from ultrathin MBE GaN/AlN quantum heterostructures

SM Islam,Vladimir Protasenko,Kevin Lee,Sergei Rouvimov,Jai Verma,Huili,Xing,Debdeep Jena
DOI: https://doi.org/10.1063/1.5000844
2017-04-28
Abstract:Deep ultraviolet (UV) optical emission below 250 nm (~5 eV) in semiconductors is traditionally obtained from high aluminum containing AlGaN alloy quantum wells. It is shown here that high-quality epitaxial ultrathin binary GaN quantum disks embedded in an AlN matrix can produce efficient optical emission in the 219-235 nm (~5.7 to 5.3 eV) spectral range, far above the bulk bandgap (3.4 eV) of GaN. The quantum confinement energy in these heterostructures is larger than the bandgaps of traditional semiconductors, made possible by the large band offsets. These MBE-grown extreme quantum-confinement GaN/AlN heterostructures exhibit internal quantum efficiency as high as 40% at wavelengths as short as 219 nm. These observations, together with the ability to engineer the interband optical matrix elements to control the direction of photon emission in such new binary quantum disk active regions offers unique advantages over alloy AlGaN quantum well counterparts for the realization of deep-UV light-emitting diodes and lasers.
Mesoscale and Nanoscale Physics
What problem does this paper attempt to address?
The problem that this paper attempts to solve is to achieve efficient and controllable light emission in the deep ultraviolet (Deep UV) spectral range. Specifically, the authors focus on achieving this goal by embedding ultrathin gallium nitride (GaN) quantum dots or quantum disks in an aluminum nitride (AlN) matrix. Traditional deep - ultraviolet light sources usually use AlGaN alloy quantum wells with a high aluminum content, but these materials face the problem of limited internal quantum efficiency (IQE), mainly due to factors such as the quantum - confined Stark effect (QCSE), edge emission caused by valence - band structure rearrangement, and non - radiative recombination caused by material defects. The main contribution of the paper is to demonstrate a new method. By using molecular beam epitaxy (MBE) growth technology to grow 2 - monolayer - (ML - ) thick GaN quantum dots in an AlN matrix, wavelength - tunable deep - ultraviolet light emission is achieved, with the shortest emission wavelength reaching 219 nanometers and an internal quantum efficiency as high as 40%. This method can not only achieve deeper - ultraviolet light emission at shorter wavelengths but also improve the internal quantum efficiency of the light source, thus providing new possibilities for the applications of deep - ultraviolet light - emitting diodes (LEDs) and lasers.