Bolometric arrays and infrared sensitivity of VO2 films with varying stoichiometry

Y. Hu,C. H. Lin,S. Min,R. L. Smith,S. Roberts

DOI: https://doi.org/10.48550/arXiv.1702.06412

2017-02-17

Abstract:Here we propose a linear microbolometric array based on VOx thin films. The linear microbolometric array is fabricated by using micromachining technology, and its thermo-sensitive VOx thin film has excellent infrared response spectrum and TCR characteristics. Nano-scale VOx thin films deposited on SiO2/Si substrates were obtained by e-beam vapor deposition. The VOx films were then annealed at temperatures between 300 to 500 C with various deposition duration time. The crystal structures and microstructures were examined by XRD, SEM and ESCA. These films showed a predominant phase of rhombohedral VO2 and the crystallinity of the VO2 increased as the annealing temperature increased. Integrated with CMOS circuit, an experimentally prototypical monolithic linear microbolometric array is designed and fabricated. The testing results of the experimental linear array show that the responsivity of linear array can approach 18KV/W and is potential for infrared image systems.

Mesoscale and Nanoscale Physics

What problem does this paper attempt to address?

The problem that this paper attempts to solve is to improve the performance of infrared detectors, especially by enhancing the sensitivity of the linear microbolometric array based on vanadium dioxide (VO₂) thin films. Although traditional cooled infrared detectors have superior performance, they have disadvantages such as large volume, high power consumption, and heavy weight. Therefore, researchers are committed to developing uncooled infrared detectors with higher stability and lower power consumption.

Specifically, the main objectives of this research include:

1. **Increase the Temperature Coefficient of Resistance (TCR)**: By adjusting the composition and process parameters of the VO₂ thin film to obtain a higher TCR value, thereby enhancing the microbolometer's ability to respond to temperature changes.
2. **Optimize the Structural Design**: Employ new micro - fabrication techniques to design and manufacture a linear microbolometric array with a better structure, in order to reduce heat conduction loss and improve infrared absorption efficiency.
3. **Integrate CMOS Read - out Circuit**: Integrate the microbolometer with a Complementary Metal - Oxide - Semiconductor (CMOS) read - out circuit to form a monolithic array, further improving the overall performance.

In summary, this paper aims to develop a high - performance linear microbolometric array based on VO₂ thin films by improving material properties and device structures, so as to meet the requirements of infrared imaging systems in practical applications.