Topological surface state dominated nonlinear transverse response and microwave rectification at room temperature
Qia Shen,Jiaxin Chen,Bin Rong,Yaqi Rong,Hongliang Chen,Tieyang Zhao,Xianfa Duan,Dandan Guan,Shiyong Wang,Yaoyi Li,Hao Zheng,Xiaoxue Liu,Xuepeng Qiu,Jingsheng Chen,Longqing Cong,Tingxin Li,Ruidan Zhong,Canhua Liu,Yumeng Yang,Liang Liu,Jinfeng Jia
2024-10-29
Abstract:Nonlinear Hall effect (NLHE) offers a novel means of uncovering symmetry and topological properties in quantum materials, holding promise for exotic (opto)electronic applications such as microwave rectification and THz detection. The BCD-independent NLHE could exhibit a robust response even at room temperature, which is highly desirable for practical applications. However, in materials with bulk inversion symmetry, the coexistence of bulk and surface conducting channels often leads to a suppressed NLHE and complex thickness-dependent behavior. Here, we report the observation of room-temperature nonlinear transverse response in 3D topological insulator Bi2Te3 thin films, whose electrical transport properties are dominated by topological surface state (TSS). By varying the thickness of Bi2Te3 epitaxial films from 7 nm to 50 nm, we found that the nonlinear transverse response increases with thickness from 7 nm to 25 nm and remains almost constant above 25 nm. This is consistent with the thickness-dependent basic transport properties, including conductance, carrier density, and mobility, indicating a pure and robust TSS-dominated linear and nonlinear transport in thick (>25 nm) Bi2Te3 films. The weaker nonlinear transverse response in Bi2Te3 below 25 nm was attributed to Te deficiency and poorer crystallinity. By utilizing the TSS-dominated electrical second harmonic generation, we successfully achieved the microwave rectification from 0.01 to 16.6 GHz in 30 nm and bulk Bi2Te3. Our work demonstrated the room temperature nonlinear transverse response in a paradigm topological insulator, addressing the tunability of the topological second harmonic response by thickness engineering.
Materials Science