Abstract:A method of designing multilayers with broadband wavelength responses for use as coatings in EUV optics at normal incidence is presented in this paper. The method is based on the well-known Fresnel equations and recursive calculation combined with a defined merit function, with random variation of the thickness of each layer. This allows the design of multilayers for specific requirements. The method was used to design Mo/Si multilayers with broadband wavelength responses for the EUV region, 18-20nm. Such mirrors were made by magnetron sputtering in 99.99% pure argon. The deposition rates, after calibration, were 0.12 nm s(-1) for molybdenum and 0.07 nm s(-1) for silicon. The broadband multilayers were deposited on 30 mm diameter K9 glass substrates with rms surface roughnesses less than 0.8 nm. For comparison, reference periodic multilayers with working wavelength of 19 nm were also deposited. X-ray reflectivity and diffraction measurements were made in theta -2 theta geometry using a D/Max-B X-ray diffractometer and Cu K alpha radiation. The results show that broadband and periodic multilayer mirrors have different performances which matched with simulation calculations. Ln order to improve the making technique, the combination of Rutherford backscattering spectroscopy with X-ray low-angle diffraction were used. We have also developed the equipment that can measure reflectivity qualitatively using a transmission grating spectrograph because of no reflectometer. The results showed that the wavelength responses of broadband multilayers were broader and the integrated reflectivities were higher than for periodic multilayers, but that the peak reflectivity was slightly lower.

Design and performance of a multilayered mirror monochromator in the low-energy region of the VUV

Development of MoSi2/Si lamellar multilayer grating for the narrowband soft x-ray monochromator

Narrow-band Si/Mo/C Multilayer Mirrors Working at 13 Nm

The Design, Fabrication and Characterization of Broadband Multilayer Mirrors for Euv Optics at Normal Incidence

Multilayers with High-Reflectivity at 19.5 Nm and Low-Reflectivity at 30.4 Nm

Aperiodic multilayer mirrors for efficient broadband reflection in the extreme ultraviolet

Development of a narrowband multilayer mirror for extracting a single order component from high harmonics in the 63–70??eV region

Dual-functional multilayer for high-reflectivity at 19.5 nm and low-reflectivity at 30.4 nm

Design of Chirped Mo/Si Multilayer Mirror in the Extreme Ultraviolet Region

Current Research Activities in the Field of Multilayer for EUV, Soft X-Ray and X-Rays in IPOE

A Near Fourier-Limited Pulse-Preserving Monochromator for Extreme-Ultraviolet Pulses in the Few-Fs Regime

Design of a Multilayer-Based Collimated Plane-Grating Monochromator for Tender X-ray Range.

Design of High-Efficiency Scanning Grating Mirror for Near-Infrared Micro-Spectrometer

Applications of Multilayer Optics

Design of the Chirped Multilayer Mirrors in Extreme Ultraviolet Region for Ultrafast Applications

Extreme Ultraviolet Multilayer Mirrors for Astronomical Observation

High-Efficiency Energy Collection Module of Vacuum Ultraviolet Monochromator Based on Image Slicers

Development of Multilayer Optics for the EUV, Soft X-ray and X-ray Regions in Tongji University

Zr/Mg multilayer mirror for extreme ultraviolet application

The Design and Fabrication of Multilayer Mirrors in EUV Region

Optimization Design of Pt/C Multilayer Supermirrorsfor Hard X-rays