Matthew J. Gira,Kevin P. Tkacz,Jennifer R. Hampton
Abstract:The surface area of electrodeposited thin films of Ni, Co, and NiCo was evaluated using electrochemical double-layer capacitance, electrochemical area measurements using the [Ru(NH$_3$)$_6$]$^{3+}$/[Ru(NH$_3$)$_6$]$^{2+}$ redox couple, and topographic atomic force microscopy (AFM) imaging. These three methods were compared to each other for each composition separately and for the entire set of samples regardless of composition. Double-layer capacitance measurements were found to be positively correlated to the roughness factors determined by AFM topography. Electrochemical area measurements were found to be less correlated with measured roughness factors as well as applicable only to two of the three compositions studied. The results indicate that in situ double-layer capacitance measurements are a practical, versatile technique for estimating the accessible surface area of a metal sample.
What problem does this paper attempt to address?
The problem that this paper attempts to solve is: how to accurately evaluate the surface area of electrodeposited nickel (Ni), cobalt (Co) and nickel - cobalt (NiCo) thin films. Specifically, the author determines the surface area of these thin films by comparing three different methods - electrochemical double - layer capacitance measurement, electrochemical area measurement using the [Ru(NH₃)₆]³⁺/[Ru(NH₃)₆]²⁺ redox couple, and atomic force microscopy (AFM) imaging, and explores the correlation between these methods.
### Main research questions:
1. **Evaluating the surface area of different materials**: The researchers selected electrodeposited nickel, cobalt and nickel - cobalt thin films as the research objects because these materials are of great value in catalytic applications.
2. **Comparing the applicability and accuracy of different measurement methods**: By comparing the results of the three methods, namely electrochemical double - layer capacitance measurement, electrochemical area measurement using the [Ru(NH₃)₆]³⁺/[Ru(NH₃)₆]²⁺ redox couple and AFM imaging, their performance on samples with different roughness is explored.
3. **Exploring the correlation between surface roughness and measurement results**: Thin film samples with different thicknesses and roughness are studied, and the relationship between their surface area and roughness factor is analyzed.
### Research background:
- **Applications of nanoporous materials**: Nanoporous metals have wide applications in batteries, capacitors, sensors, etc. due to their high specific surface area, high strength and excellent optical, electrical, thermal and catalytic properties.
- **Importance of surface area**: For porous metals, the surface area is an important factor affecting the reactivity. Therefore, it is crucial to develop simple and practical surface area measurement methods.
- **Limitations of existing measurement methods**: For example, the BET method is commonly used but is limited by the heat - treatment effect and the large amount of sample required; while electrochemical methods can be measured in - situ, avoiding these problems.
### Method overview:
- **Electrodeposition process**: The thickness and roughness of the thin film are changed by controlling the total charge amount during the deposition process.
- **Physical characterization**: The surface roughness of the thin film is measured by AFM, and the roughness factor (RF) is calculated.
- **Electrochemical characterization**: It includes double - layer capacitance measurement and electrochemical area measurement using the [Ru(NH₃)₆]³⁺/[Ru(NH₃)₆]²⁺ redox couple.
### Conclusions:
- **Electrochemical double - layer capacitance measurement**: It is positively correlated with the roughness factor measured by AFM, is applicable to multiple metal systems, and is an effective means for semi - quantitative evaluation of the electrochemically accessible surface area.
- **Electrochemical area measurement using the [Ru(NH₃)₆]³⁺/[Ru(NH₃)₆]²⁺ redox couple**: It is not applicable to some materials (such as cobalt), and has a poor correlation with the roughness factor.
- **AFM imaging**: It provides direct surface topography information, but may have limitations for the measurement of complex structures.
In general, this study provides a simple and universal method for electrochemical double - layer capacitance measurement to estimate the accessible surface area of metal thin films, which is of great significance for catalytic research.