Abstract:It is difficult to generate and maintain the vacuum level in vacuum MEMS (Micro-Electro-Mechanical Systems) devices. Currently, there is still no single method or device capable of generating and maintaining the desired vacuum level in a vacuum device for a long time. This paper proposed a new wide-pressure-range miniature ion source, which can be applied to a vacuum micropump. The miniature ion source consists only of silicon electrodes and a glass substrate. Its operating pressure range covers seven orders of magnitude, starting from atmospheric pressure, a promising solution to the difficulty. Based on the principle of gas discharge, the ion source features a simple two-electrode structure with a two-stage electrode spacing, operating under DC voltage excitation. The first-stage electrode spacing of the ion source is small enough to ensure that it starts working at atmospheric pressure down to a certain reduced pressure when it automatically switches to discharge at the larger second-stage electrode spacing and operates from that pressure down to a high vacuum. Two configurations of the ion source have been tested: without-magnet, operating from atmospheric pressure down to 1 mbar; and with-magnet, operating from atmospheric pressure to 10(-4) mbar, which covers seven orders of magnitude of pressure. The ion source can be applied not only to a MEMS ion pump to meet demands of a variety of vacuum MEMS devices, but can also be applied to other devices, such as vacuum microgauges and mass spectrometers.

Vacuum Technology for Ion Sources

Vacuum Arc Ion Sources

Vacuum Technology for Superconducting Devices

Vacuum Arc Ion Source for Heavy Ion Fusion

Cathode Design Optimization Toward The Wide-Pressure-Range Miniature Discharge Ion Source For A Vacuum Micropump

Pumping Dynamics of Cold-Atom Experiments in a Single Vacuum Chamber

Production of High-Intensity, Highly Charged Ions

Ion getter pumps

Pulsed vacuum arc plasma source of supersonic metal ion flow

Microgan electron cyclotron resonance ion source in a Van de Graaff accelerator terminal

Design Study of Primary Ion Provider for Relativistic Heavy Ion Collider Electron Beam Ion Source

Increasing the operational stability of a vacuum neutron tube ion source

Modeling of Beam-Ionized Sources for Plasma Accelerators

Efficient Gas Ion Source with Space Charge

Coaxial Ion Source : pressure dependence of gas flow and field ion emission

High-Current Vacuum Arc Under Axial Magnetic Field: Numerical Simulation And Comparisons With Experiments

Design of Triode Extraction System for a Dual Hollow Cathode Ion Source

Ion Sources for Medical Applications

Status of the Los Alamos heavy ion injector

Influence of Discharge Gap on the Discharge Stability in a Short Vacuum Arc Ion Source.

Modern High Intensity H- Accelerator Sources