Abstract:Chemical vapor deposition (CVD) is an important technique for surface modification of powders through either grafting or deposition of films and coatings. The efficiency of this complex process primarily depends on appropriate contact between the reactive gas phase and the solid particles to be treated. Based on this requirement, the first part of this review focuses on the ways to ensure such contact and particularly on the formation of fluidized beds. Combination of constraints due to both fluidization and chemical vapor deposition leads to the definition of different types of reactors as an alternative to classical fluidized beds, such as spouted beds, circulating beds operating in turbulent and fast-transport regimes or vibro-fluidized beds. They operate under thermal but also plasma activation of the reactive gas and their design mainly depends on the type of powders to be treated. Modeling of both reactors and operating conditions is a valuable tool for understanding and optimizing these complex processes and materials. In the second part of the review, the state of the art on materials produced by fluidized bed chemical vapor deposition is presented. Beyond pioneering applications in the nuclear power industry, application domains, such as heterogeneous catalysis, microelectronics, photovoltaics and protection against wear, oxidation and heat are potentially concerned by processes involving chemical vapor deposition on powders. Moreover, simple and reduced cost FBCVD processes where the material to coat is immersed in the FB, allow the production of coatings for metals with different wear, oxidation and corrosion resistance. Finally, large-scale production of advanced nanomaterials is a promising area for the future extension and development of this technique.

Review—Silicon Carbide Thin Film Technologies: Recent Advances in Processing, Properties, and Applications: Part II. PVD and Alternative (Non-PVD and Non-CVD) Deposition Techniques

Silicon Carbide Thin Film Technologies: Recent Advances in Processing, Properties, and Applications - Part I

Progresses in Synthesis and Application of SiC Films: From CVD to ALD and from MEMS to NEMS

Review—Silicon Nitride and Silicon Nitride-Rich Thin Film Technologies: State-of-the-Art Processing Technologies, Properties, and Applications

One-dimensional SiC Nanostructures: Designed Growth, Properties, and Applications

Silicon Nitride and Hydrogenated Silicon Nitride Thin Films: A Review of Fabrication Methods and Applications

MACHINING PROCESSES OF SILICON CARBIDE : A REVIEW

Recent Progress on Single-Crystal Growth and Epitaxial Growth of 4H Silicon Carbide

A Comprehensive Review of Recent Progress, Prospect and Challenges of Silicon Carbide and its Applications

Amorphous SiC Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition for Passivation in Biomedical Devices

Investigations of TiC and SiC films synthesized by DC magnetron sputtering and thermal annealing

Principles and applications of CVD powder technology

A Review of Femtosecond Laser Processing of Silicon Carbide

An overview of conventional and new advancements in high kappa thin film deposition techniques in metal oxide semiconductor devices

Atomic Layer Deposition for Nanoscale Oxide Semiconductor Thin Film Transistors: Review and Outlook

Structure/property/process relationships in chemical vapor deposition CVD

Thin film Deposition Methods: A Critical Review

Chemical Vapor Deposition Growth and Applications of Two-Dimensional Materials and Their Heterostructures

Recent Advances in Chemical Mechanical Polishing Technologies of Silicon Carbide

Review of SiC crystal growth technology