Abstract:A plasma arc generator was used to heat treat the free-standing CVD diamond films at 1450–1900 °C. An Arrhenius curve was fit according to trends in the measured Raman peak intensity ratio of diamond to graphite as a function of heat treatment temperature, and the curve was extrapolated linearly. It was found that the extrapolation lines intersected at the Debye temperature, Θ D = 2021 K. By comparing the activation energies of diamond graphitization in literature and from different measurement modes in our study, it was found that the graphitization mechanisms were different on both sides of Debye temperature due to differences in the excited lattice vibration modes. When the heat treatment temperature was just below the Debye temperature, the graphitization process was promoted by generating vacancies or the breaking of single CC bonds, and the apparent activation energy was 366 ± 60 kJ·mol−1. When the heat treatment temperature was above the Debye temperature, the graphitization process was promoted by the simultaneous breaking of multiple CC bonds, and the apparent activation energy was 887 ± 141 kJ·mol−1. In combination with the morphology changes on the surface of the CVD diamond film after high temperature heat treatment, the mechanism of the micro-cyclic phase transition on the surface of the diamond film at temperatures lower than Debye temperature was summarized as follows. First, CC bonds on the diamond surface were activated and broken at high temperatures, and some diamond carbon atoms dissociated from solid phase sites to the gas phase by forming hydrocarbon free radicals. Then, the carbon atoms from these hydrocarbons entered the graphite lattice step by step to complete the spontaneous deposition of sp2 clusters.

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Low temperature critical growth of high quality nitrogen doped graphene on dielectrics by plasma-enhanced chemical vapor deposition.

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