Morphological Relaxation of Strained Epitaxial Films for Stripe‐Geometry Devices
Kennet D. R. Hannikainen,Fabien Deprat,Olivier Gourhant,Isabelle Berbezier,Jean‐Noël Aqua
DOI: https://doi.org/10.1002/admt.202301655
IF: 6.8
2024-01-03
Advanced Materials Technologies
Abstract:A new morphological evolution describing the relaxation of a strained epitaxial film deposited on a pattern with a stripe geometry is reported, paradigmatic of 2D like systems, and characteristic of transistors channels geometry. Both the elastic equation and surface diffusion equation are analytically solved, and reveal the different resulting geometries. One of the major issues when reducing the channel length in strained transistors is the stress relaxation that significantly degrades the carriers mobility. A new morphological evolution is reported here, describing the relaxation of a strained epitaxial film deposited on a pattern characterized by stripe geometry, both paradigmatic of two‐dimensional (2D) like systems, and characteristic of many devices. The thermodynamic surface diffusion framework accounting for elasticity and capillarity is investigated. The former is solved in two dimensions thanks to the Airy formalism. The resulting dynamical Schrödinger‐like equation governing the film shape evolution is then solved thanks to a decomposition on eigenmodes. It reveals different developments depending upon the system's geometric parameters and the time scale. Mass transfer occurs toward the relaxed areas and creates a ridge at the nanolayers edges, controlled by the geometry and the scale of the structure. These results allow to refine the potential control of electronic properties via the geometry of a system.
materials science, multidisciplinary