Abstract:Abstract Plasmonic lithography, which uses the evanescent electromagnetic (EM) fields to generate image beyond the diffraction limit, has been successfully demonstrated as an alternative lithographic technology for creating sub-10 nm patterns. However, the obtained photoresist pattern contour in general exhibits a very poor fidelity due to the near-field optical proximity effect (OPE), which is far below the minimum requirement for nanofabrication. Understanding the near-field OPE formation mechanism is important to minimize its impact on nanodevice fabrication and improve its lithographic performance. In this work, a point-spread function (PSF) generated by a plasmonic bowtie-shaped nanoaperture (BNA) is employed to quantify the photon-beam deposited energy in the near-field patterning process. The achievable resolution of plasmonic lithography has successfully been enhanced to approximately 4 nm with numerical simulations. A field enhancement factor ( F ) as a function of gap size is defined to quantitatively evaluate the strong near-field enhancement effect excited by a plasmonic BNA, which also reveals that the high enhancement of the evanescent field is due to the strong resonant coupling between the plasmonic waveguide and the surface plasmon waves (SPWs). However, based on an investigation of the physical origin of the near-field OPE, and the theoretical calculations and simulation results indicate that the evanescent-field-induced rapid loss of high- k information is one of the main optical contributors to the near-field OPE. Furthermore, an analytic formula is introduced to quantitatively analyze the effect of the rapidly decaying feature of the evanescent field on the final exposure pattern profile. Notably, a fast and effective optimization method based on the compensation principle of the exposure dose is proposed to reduce the pattern distortion by modulating the exposure map with dose leveling. The proposed pattern quality enhancement method can open new possibilities in the manufacture of nanostructures with ultrahigh pattern quality via plasmonic lithography, which would find potentially promising applications in high density optical storage, biosensors, and plasmonic nanofocusing.

Laser heat-mode patterning with improved aspect-ratio

Subdiffraction 3D Nanolithography by Two‐Photon Two‐Step Absorption and Photoinhibition

Peripheral-photoinhibition-based Direct Laser Writing with Isotropic 30 Nm Feature Size Using a Pseudo 3D Hollow Focus

High-resolution 3D Nanoprinting Based on Two-Step Absorption Via an Integrated Fiber-Coupled Laser Diode.

Fabrication of micro/nano multifunctional patterns on optical glass through chalcogenide heat-mode resist AgInSbTe

Micro-Fabrication and Monitoring of Three-Dimensional Microstructures Based on Laser-Induced Thermoplastic Formation

Laser‐Assisted Thermal Exposure Lithography: Arbitrary Feature Sizes

Ultrafast Laser Processing for High-Aspect-Ratio Structures

Amplitude-phase Optimized Long Depth of Focus Femtosecond Axilens Beam for Single-Exposure Fabrication of High-Aspect-ratio Microstructures

Self‐Aligned Laser‐Induced Periodic Surface Structures for Large‐Area Controllable Nanopatterning

Realising high aspect ratio 10 nm feature size in laser materials processing in air at 800 nm wavelength in the far-field by creating a high purity longitudinal light field at focus

Combining thermal scanning probe lithography and dry etching for grayscale nanopattern amplification

Laser-induced photoelectrochemical lithography

Fabrication of high-aspect-ratio fused silica microstructures with large depths using Bessel-beam femtosecond laser-assisted etching

Laser-Induced Bubble Dynamics Optimization for High-Aspect-Ratio 3D Micro-Fluidic Channels Fabrication

An Improved Multi-Exposure Approach for High Quality Holographic Femtosecond Laser Patterning

High‐Efficiency and Low‐Intensity Threshold Femtosecond Laser Direct Writing of Precise Metallic Micropatterns on Transparent Substrate

Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation

Thermodynamic Processes on a Semiconductor Surface During In‐situ Multi‐beam Laser Interference Patterning

Controllable Si micro-structuring by temporally modulated single-shot femtosecond pulse lithography

Increasing Heat Transfer from Metal Surfaces through Laser-Interference-Induced Microscopic Heat Sinks