Abstract:The diffraction efficiencies of a Fresnel zone plate (ZP), fabricated by Xradia Inc. using the electron-beam writing technique, were measured using polarized, monochromatic synchrotron radiation in the extreme ultraviolet wavelength range 3.4-22 nm. The ZP had 2 mm diameter, 3330 zones, 150 run outer zone width, and a 1 mm central occulter. The ZP was supported by a 100 rim thick Si3N4 membrane. The diffraction patterns were recorded by CMOS imagers with phosphor coatings and with 5.2 mu m or 48 mu m pixels. The focused +n orders (n=1-4), the diverging -1 order, and the undiffracted 0 order were observed as functions of wavelength and off-axis tilt angle. Sub-pixel focusing of the +n orders was achieved. The measured efficiency in the +1 order was in the 5% to 30% range with the phase-shift enhanced efficiency occurring at 8.3 nm where the gold bars are partially transmitting. The +2 and higher order efficiencies were much lower than the +1 order efficiency. The efficiencies were constant when the zone plate was tilted by angles up to +/- 1 degrees from the incident radiation beam. This work indicates the feasibility and benefits of using zone plates to measure the absolute EUV spectral emissions from solar and laboratory sources: relatively high EUV efficiency in the focused +1 order, good out-of-band rejection resulting from the low higher-order efficiencies and the ZP focusing properties, insensitivity to (unfocused) visible light scattered by the ZP, flat response with off-axis angle, and insensitivity to the polarization of the radiation based on the ZP circular symmetry. EUV sensors with Fresnel zone plates potentially have many advantages over existing sensors intended to accurately measure absolute EUV emission levels, such as those implemented on the GOES N-P satellites that use transmission gratings which have off-axis sensitivity variations and poor out-of-band EUV and visible light rejection, and other solar and laboratory sensors using reflection gratings which are subject to response variations caused by surface contamination and oxidation.

Performance Test of Fresnel Zone Plate with 50 nm Outermost Zone Width in Hard X-ray Region

Formation of Sub-Half-Wavelength Focal Spot with Ultra Long Depth of Focus

Design of objective lens with reflective spherical Fresnel zone plate

Interlaced zone plate optics for hard X-ray imaging in the 10 nm range

A study of structural effects on the focusing and imaging performance of hard X‐rays with 20–30 nm zone plates

A Compound Kinoform/Fresnel Zone Plate Lens with 15 Nm Resolution and High Efficiency in Soft X-Ray.

Demonstration of 12 nm Resolution Fresnel Zone Plate Lens based Soft X-ray Microscopy

High-efficiency focusing and imaging by dielectric kinoform zone plate lenses with soft X-rays.

Simulation of an X-ray Fresnel Zone Plate with Nonideal Factors

High-efficiency multilevel zone plates for keV X-rays

A dielectric Kinoform zone plate with 15 nm resolution and high efficiency for soft X-ray optics

Ion beam lithography for Fresnel zone plates in X-ray microscopy

Measurement of Zone Plate Efficiencies in the Extreme Ultraviolet and Applications to Radiation Monitors for Absolute Spectral Emission

Focusing a beam beyond the diffraction limit using a hyperlens-based device

Fresnel Zone-Plate Based X-Ray Microscopy In Zernike Phase Contrast With Sub-50 Nm Resolution At Nsrl

Flash X-ray backlight technique using a Fresnel phase zone plate for measuring interfacial instability

Imaging and focusing of atoms by a fresnel zone plate

Millimeter-wave Fresnel-zone plate lens and antenna

Effect of focusing error and illumination with polychromatic light on zone plate light spot

Development of A Hard X-Ray-Imaging Microscope

Fractal zone plates for wideband imaging with low chromatic aberration and extended depth of field