Abstract:The quality of the films obtained by magnetron sputtering depends on numerous parameters, including the energy of the ions impinging on the substrate. The energy distribution functions of Ar and Ag ions during magnetron sputtering of a silver target in rf argon plasmas are hereby reported. Measurements were carried out by plasma sampling mass spectrometry at (i) various bias voltages on the surface of the target at constant pressure and (ii) various operating pressures at constant bias voltage. A distinct high-energy tail is observed for the sputtered silver ions (ionized in the plasma) in comparison to the argon gas ions. The results indicate that the sputtered Ag atoms are not completely thermalized by collisions with background gas atoms over the range of experimental conditions investigated. To confirm such assertion, a model has been developed for the ejection of Ag atoms from the target, their transport in the gas phase, and their acceleration in the sheath at the surface of the mass spectrometer. Since sputtering occurs at low impinging ion energies, the energy distribution function of the extracted atoms cannot be represented by the usual Sigmund–Thomson distribution. It is rather assumed to be characterized by a bi-Maxwellian distribution, with one population related to the direct “classical” sputtering and the other one to indirect “2-step etching.” During the transport of Ag neutrals, both ionization and thermalization processes are considered. Finally, the rf sheath near the entry of the mass spectrometer oscillates at a period close to the transit time of the ions passing through it. This induces a complex energy gain also implemented in the model. An excellent agreement between the latter and experimental measurements is obtained. The results are used to probe the effect of the bias voltage and pressure on the fitting parameters, namely, the dc and rf components of the voltage drop in the sheath, the mean energy of the sputtered atoms, and the relative importance of the sputtered populations.

Modeling low energy sputtering of hexagonal boron nitride by xenon ions

Electron Knock-On Damage in Hexagonal Boron Nitride Monolayers

Energy fluxes in a radio-frequency magnetron discharge for the deposition of superhard cubic boron nitride coatings

Quantum theory of electronic excitation and sputtering by transmission electron microscopy

Highly ionized xenon and volumetric weighting in restricted focal geometries

A Xenon Collisional-Radiative Model Applicable to Electric Propulsion Devices: I. Calculations of Electron-Impact Cross Sections for Xenon Ions by the Dirac B-spline R-matrix Method

Monte Carlo modeling of low-energy electron-induced secondary electron emission yields in micro-architected boron nitride surfaces

BCA Simulations of Ion Irradiation of Tungsten Fuzz

Simulation of Polycrystalline Beryllium Sputtering by H, D, T Atoms

Synthesis and Characterization of Boron Nitride Thin Films Deposited by High-Power Impulse Reactive Magnetron Sputtering

Integrated modeling of boron powder injection for real-time plasma-facing component conditioning

Evaluation of nickel self-sputtering yields by molecular-dynamics simulation

A Xenon Collisional-Radiative Model Applicable to Electric Propulsion Devices: II. Kinetics of the 6s, 6p, and 5d States of Atoms and Ions in Hall Thrusters

Study on Sputtering Yield of Hall Thruster Discharge Chamber Wall

Understanding vapor phase growth of hexagonal boron nitride

Accurate argon cluster-ion sputter yields: Measured yields and effect of the sputter threshold in practical depth-profiling by x-ray photoelectron spectroscopy and secondary ion mass spectrometry

Experiments and kinetic modeling of the ion energy distribution function at the substrate surface during magnetron sputtering of silver targets in radio frequency argon plasmas

A density functional tight-binding based strategy for modeling ion bombardment and its application to Ar bombardment of silicon nitride

Impact ionization and transport properties of hexagonal boron nitride in constant-voltage measurement

Numerical Study of Hall Thruster Plume and Sputtering Erosion

Sputtering of targets in high-intensity heavy-ion beam experiments