Measurement of surface alpha-acrivity of different samples with ion pulse ionization chamber

Yu.M.Gavriljuk,V.N.Gavrin,A.M.Gangapshev,V.V.Kazalov,V.V.Kuzminov,S.I.Panasenko,S.S.Ratkevich
DOI: https://doi.org/10.48550/arXiv.0711.2614
2007-11-16
Abstract:The construction of an ion pulse ionization chamber aimed at measuring ultra-low levels of surface alpha-activity of different samples is described. The results of measurement carried out with alpha-source and copper samples and light-reflecting film VM2000 are presented.
Instrumentation and Detectors
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