Interfaces enhanced plasma irradiation resistance in CrMoTaWV/W multilayer films through blocking He diffusion

Chenyi Qu,Mengqing Hong,Guo Wei,Wentao Ge,Enkai Guo,Fen Zhong,Guangxu Cai,Yongqiang Wang,Feng Ren
DOI: https://doi.org/10.1088/1741-4326/ad5aaf
IF: 3.3
2024-06-22
Nuclear Fusion
Abstract:The performance of Plasma-facing materials (PFMs) is one of the key factors that significantly impact the stability of operation in fusion reactors. Herein, a new CrMoTaWV/W (HEA/W) multilayer structure is designed as PFM to investigate its resistance to He plasma irradiation. It was observed that the introduction of the interfaces effectively absorbed plenty of He atoms, preventing them from diffusing into the material and delaying the formation of fuzz incubation zone, therefore, enhancing the resistance to plasma irradiation. The thickness transformed to fuzz in the HEA/W multilayer films was observed to be about two-thirds of those in the CrMoTaWV (HEA) film. Additionally, the fuzz growth rates in HEA/W multilayer films are lower than the average growth rate of bulk W and HEA films. These findings highlight a promising new avenue for the exploration of high-performance PFMs.
physics, fluids & plasmas
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