Photoelectrochemical performance of a UV-cured all-solid-state complementary ITO/WO3/Ta2O5/electrolyte/NiO/ITO electrochromic device deposited by ion-beam assisted electron-beam evaporation

Hsi-Chao Chen,Yi-Ren Chen,Tan-Fu Liu
DOI: https://doi.org/10.1016/j.electacta.2021.138355
IF: 6.6
2021-06-01
Electrochimica Acta
Abstract:<p>This research investigates the optical, nanostructure, electrochemical, and binding-energy performances of a Nickel Oxide (NiO) auxiliary layer for a complementary ultraviolet (UV)-cured all-solid-state electrochromic device (ECD). The complementary ITO/WO<sub>3</sub>/Ta<sub>2</sub>O<sub>5</sub>/Electrolyte/NiO/ITO ECD was separated into two sub-modules, one being the colored NiO anode, the other being the colored WO<sub>3</sub> cathode. These were combined using UV curing LiClO<sub>4</sub>+PC+UV glue as a solid electrolyte. The NiO film was deposited by ion-beam assisted (IAD) electron-beam evaporation under different oxygen flow rates ranging from 5 to 20 sccm, and the evaporation formed columnar nanostructures that allowed the Li<sup>+</sup> ions to enter and leave. These experimental results exhibited location shifts for the binding-energy of Ni3d and O1s has the blue shift at the oxygen flow far away of 15 sccm. Depositing the NiO film under an oxygen flow of 15 sccm (111) showed the highest color/bleach variation of ΔT=45.9%@550nm, the greatest cyclic voltammetry (CV) cladding area of Q=31.39 mC, an alternating current (AC) impedance of 28kΩ, and an ionic conduction rate of 4.46×10<sup>−7</sup> S cm<sup>−1</sup>. The columnar NiO film deposited using IAD electron-beam evaporation has the potential to be used as an auxiliary layer for an all-solid-state ECD.</p>
electrochemistry
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