An Ultra‐Thin, Ultra‐High Capacitance Density Tantalum Capacitor for 3D Packaging

Jiping Zhao,Youlong Xu,Wenqiang Hou,Yizhuo Li,Xiangdong Ding

DOI: https://doi.org/10.1002/admt.202201967

IF: 6.8

2023-03-23

Advanced Materials Technologies

Abstract:Flexible tantalum (Ta) capacitors with ultra‐thin and ultra‐high capacitance density are prepared based on nano‐porous Ta foil obtained by direct current pulse etching. Its capacitance density is higher than all commercially available embedded capacitors reported to date. This work provides a valuable reference for the large‐scale application of the embedded capacitor in advanced packaging technology. Although embedded capacitors have been applied and researched for many years, their large‐scale application still faces challenges such as low capacitance density, high thickness, high cost, and incompatibility with integrated processes. In this work, a breakthrough has been made in the fabrication of ultra‐thin tantalum (Ta) capacitors with ultra‐high capacitance density that can be used for 3D packaging. The key to these excellent performances is the application of Ta foil with nano‐porous structure to the anode of the capacitor. The Ta foil with high specific surface area (SSA) is successfully prepared by direct current pulse etching. At a current density of 15 mA cm−2, a pulse frequency of 50 Hz, and a duty cycle of 30%, the SSA of Ta foil is increased by 76 times after etching in an electrolyte with 0.01 v% TOA for 30 min. Based on this, Ta capacitors with a form factor of less than 40 μm, showing a capacitance density of 750 nF mm−2 and a leakage current of less than 2.1 × 10−7 A at 8 V is successfully fabricated. To the best of the authors' knowledge, this is the highest capacitance density reported to date for the mentioned form factors.

materials science, multidisciplinary