Visible-frequency plasmonic enhancement at the edge of graphene/ h -BN heterostructures on silicon substrate

Jaroslav Kuliček,Takatoshi Yamada,Takashi Taniguchi,Bohuslav Rezek
DOI: https://doi.org/10.1016/j.carbon.2024.118836
IF: 10.9
2024-01-23
Carbon
Abstract:Heterostructures of graphene and hexagonal boron nitride (G/ h -BN) have been widely studied for controlling and utilizing graphene electronic properties. Here we characterize specific optical and electronic properties of G/ h -BN heterostructures made of a high-quality single layer chemical vapor deposition (CVD) graphene laid over h -BN flakes, with focus on plasmonic effects. We compare the G/ h -BN properties on Si and SiO 2 substrates by micro-Raman spectroscopy mapping, Kelvin probe force microscopy, optical and atomic force microscopy. We observe highly enhanced Raman intensity (up to 280 %) from Si as well as graphene along the G/ h -BN edge. It is attributed to localized concentration of electrons in graphene and suitable perpendicular orientation of plasmonic vibrations at the edge. The plasmonic Raman enhancement occurs under a visible light excitation (532 nm) and the effect can be tuned by the h -BN flake thickness (10–150 nm). The enhancement is specific to G/ h -BN/Si structures, on G/ h -BN/SiO 2 structures the Raman signal is suppressed while I 2D /I G ratio is increased. Vice versa, change of surface potential under visible light illumination (photovoltage) is on G/ h -BN/Si negligible (within 10 mV) compared to the G/ h -BN/SiO 2 structures. These results open new prospects for broad utilization of localized visible plasmonic effects in graphene.
materials science, multidisciplinary,chemistry, physical
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