Nanoscale self-affine surface smoothing by ion bombardment

D. K. Goswami,B. N. Dev

DOI: https://doi.org/10.1103/PhysRevB.68.033401

2002-12-23

Abstract:Topography of silicon surfaces irradiated by a 2 MeV Si$^+$ ion beam at normal incidence and ion fluences in the range $10^{15}-10^{16}$ ions/cm$^{2}$ has been investigated using scanning tunneling microscopy. At length scales below $\sim$~50 nm, surface smoothing is observed; the smoothing is more prominent at smaller length scales. The smoothed surface is self-affine with a scaling exponent $\alpha=0.53\pm0.02$.

Materials Science

What problem does this paper attempt to address?

The problem that this paper attempts to solve is the evolution of the surface topography of solids under ion - beam bombardment, especially the surface smoothing phenomenon and its self - affine characteristics when ions are incident at near - perpendicular angles. Specifically, the authors experimentally studied the surface smoothing phenomenon at different length scales when a 2 MeV Si+ ion beam bombarded the silicon surface in the normal direction, and analyzed the physical mechanism behind this smoothing phenomenon.

### Research Background and Problems

1. **Fundamental Problems in Materials Science**
- The influence of particle radiation on the solid surface is an important research topic. During ion - beam bombardment, the change in surface roughness is determined by the competition between surface roughening caused by sputtering and smoothing caused by surface diffusion.
- This competitive process can produce characteristic surface structures, such as quasi - periodic ripples and self - affine topologies.

2. **Limitations of Existing Research**
- Most studies on ion - beam bombardment focus on cases where the ion energy is high and the incident angle is oblique. Under these conditions, the surface mainly exhibits roughening.
- There are relatively few studies on surface smoothing caused by ion beams, and especially the research on the scaling properties of the smoothed surface is even more lacking.

### Research Objectives

- **Observe and Characterize the Surface Smoothing Phenomenon**
- Study the changes in surface topography after a 2 MeV Si+ ion beam bombards the silicon surface in the normal direction by using a scanning tunneling microscope (STM).
- Pay special attention to the surface smoothing phenomenon at length scales less than 50 nm.

- **Determine the Self - affine Characteristics**
- Calculate and analyze the change of surface roughness with the horizontal sampling length, and determine the self - affine characteristics of the surface and its scaling index α.

### Main Findings

- **Surface Smoothing Phenomenon**
- An obvious surface smoothing phenomenon was observed at length scales less than 50 nm.
- The smoothing phenomenon is more significant at smaller length scales.

- **Self - affine Characteristics**
- The change of surface roughness σ with the horizontal sampling length L conforms to the self - affine characteristics, that is, \(\sigma\propto L^{\alpha}\), where the scaling index \(\alpha = 0.53\pm0.02\).

### Physical Mechanisms

- **Low Sputtering Yield**
- Due to high - energy ions (2 MeV) and normal incidence, the sputtering yield is very low (< 0.2 atoms/ion), so the surface erosion is not obvious.

- **Collision - Induced Atomic Displacement**
- A large number of low - energy (< 4.7 eV) atoms generated by the collision between ions and surface atoms cannot escape from the surface, but can move parallel to the surface, resulting in effective surface diffusion and smoothing.

### Conclusions

- This study systematically characterized for the first time the surface smoothing phenomenon and its self - affine characteristics when a high - energy ion beam bombards the silicon surface in the normal direction.
- This finding is of great significance for the surface treatment of nanostructured devices and may be used to reduce the surface roughness of nanostructured devices, thereby improving their performance.

### Future Research Directions

- Further theoretical research is needed to explain the observed value of the scaling index α, especially in the case where surface diffusion is dominant.
- The surface dynamics model under high - energy ion bombardment needs to consider the influence of the energy release depth on surface atoms.