Asymmetry-Induced Redistribution in Sn(IV)–Ti(IV) Hetero-Bimetallic Alkoxide Precursors and Its Impact on Thin-Film Deposition by Metal–Organic Chemical Vapor Deposition

Shashank Mishra,Erwann Jeanneau,Liang Tian,Ioana Nuta,Elisabeth Blanquet,Deobrat Singh,Rajeev Ahuja,Catherine Marichy,Stéphane Daniele,Stéphane Daniele
DOI: https://doi.org/10.1021/acs.cgd.1c01136
2021-12-02
Abstract:With an aim to enhance the stability and volatility of the heterometallic derivative [SnCl4(μ-OEt)2Ti­(OEt)2­(HOEt)2] (A), obtained conveniently and quantitatively as a simple adduct formula from the equivalent reaction of commercially available SnCl4 and Ti­(OEt)4 in toluene/ethanol, its modification with 2,2,6,6-tetramethyl-3,5-heptanedione (thdH) is reported. The modified precursor [SnCl4(μ-OEt)2Ti­(thd)­(OEt)­(HOEt)] (1), obtained from an equimolar reaction of A and thdH, is stable at room temperature but rearranges on heating into A and [SnCl4(μ-OEt)2Ti­(thd)2] (2), as confirmed by vapor pressure measurements and density functional theory calculations. The heterometallic 2 can be obtained in excellent yield from the reaction of A and thdH in a 1:2 molar ratio and is stable in the solid and solution phase up to 200 °C. However, the asymmetric nature of its structure consisting of fragments of titanium β-diketonate and tin chloride connected by bridging ethoxo groups leads to its breakdown into two homometallic components in the gas phase, leading to the deposition of tin-rich metal oxide films on the substrate.
chemistry, multidisciplinary,materials science,crystallography
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