Reducing the incorporation of contaminant oxygen in decorative TiN coatings deposited by low temperature reactive sputtering

Nuno M. Figueiredo,Pedro Mateus,Filipa Ponte,Pooja Sharma,Jorge Ferreira,Diogo Cavaleiro,Jonas Deuermeier,Fábio Ferreira,Albano Cavaleiro,Sandra Carvalho
DOI: https://doi.org/10.1016/j.vacuum.2024.113325
IF: 4
2024-05-25
Vacuum
Abstract:This paper focuses on the low-temperature deposition and characterization of titanium nitride coatings. It investigates how the deposition conditions influence the incorporation of contaminant oxygen and the functional properties of the coatings. The coatings were reactively sputtered in an Ar + N 2 atmosphere under two different substrate conditions: floating and bias modes. The target poisoning process was studied by selecting different N 2 flow rates. The Ti/N ratio and the contaminant concentration varied greatly with the N 2 flow rate and substrate bias condition. Both the Ti/N ratio and oxygen inclusion produced important modifications in the structural, chemical, optical and electrical properties of the TiN coatings. Samples deposited in floating mode showed oxygen contents up to 25 at.%, and TiN crystals that were preferentially oriented along the [111] and [110] directions. These coatings exhibited dark brownish colorations. Samples deposited in bias mode showed reduced oxygen contents between 6-12 at. % and promoted the crystallization of TiN with the [110] preferential orientation. These coatings presented bright yellowish colorations. By sputter depositing TiN coatings at low substrate temperatures, under appropriate deposition conditions, the desired decorative properties can be achieved while preserving the integrity of sensitive substrates, such as polymers.
materials science, multidisciplinary,physics, applied
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