Direct Photo‐Crosslinking Patterning for High‐Performance 0D–2D Hybrid Photodetectors

Jung‐Min Kim,Seock‐Jin Jeong,Hae‐Sik Kim,Do‐Eok Kim,Jeong Hwan Yu,Sang‐Hyeon Lee,Jae‐Hyeon Ahn,Sinyoung Cho,Weon‐Sik Chae,Jong‐Soo Lee
DOI: https://doi.org/10.1002/adom.202401755
IF: 9
2024-10-05
Advanced Optical Materials
Abstract:The direct pattering of QD layers up to 2 μm resolution is demonstrated without degradation of PL. Additionally, enhanced majority carrier mobility, validated through PL quenching, TR‐PL, and UPS analysis is observed. As a result, the CdSe/CdZnS‐TBBT/MoS2 hybrid photodetectors exhibits a high photoresponsivity of ≈105AW−1 and a detectivity of over 1011Jones at 1.5μW cm−2 with a 2 V bias voltage. High‐performance 0D–2D hybrid photodetectors integrated with a crosslinker for direct pattering of quantum dots on the large‐scale synthesized MoS2 layer are reported. In the patterned hybrid structure, QD layers are patterned with a resolution of up to 2 μm, ensuring high precision. Enhanced charge transfer from QDs to 2D materials is confirmed using PL quenching, TR‐PL, and UPS analysis. As a result, the QD/2D hybrid photodetectors with crosslinker‐assisted direct patterning demonstrated a remarkable photoresponsivity of ≈105 A W−1 and a specific detectivity of over 1011 Jones, attributed to the difference in built‐in potential. The crosslinker patterning of QDs opens up potential applications for the photodetectors in highly integrated image sensors and can be further extended to high‐resolution display industries, eliminating unnecessary fabrication processes.
materials science, multidisciplinary,optics
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