Intrinsically Photopatternable High‐k Polymer Dielectric for Flexible Electronics (Adv. Funct. Mater. 47/2024)

Gunoh Lee,Seong Cheol Jang,Ju Hyeok Lee,Ji‐Min Park,Byeongil Noh,Hyuk Choi,Hyukmin Kweon,Do Hwan Kim,Hyun You Kim,Hyun‐Suk Kim,Kyung Jin Lee
DOI: https://doi.org/10.1002/adfm.202470280
IF: 19
2024-11-18
Advanced Functional Materials
Abstract:Flexible Electronics In article number 2405530, Hyun You Kim, Hyun‐Suk Kim, Kyung Jin Lee, and co‐workers present a parylene‐OH polymeric thin film, synthesized via a CVD process, that exhibits unique intrinsic photo‐patternable properties, offering exceptional dielectric performance and flexible durability. The illustration suggests that parylene‐OH deposited through CVD can be easily photo‐patterned by simply irradiating it with 254 nm UV light, followed by an organic solvent rinse, resulting in high‐resolution patterning.
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
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