Intrinsically Photopatternable High‐k Polymer Dielectric for Flexible Electronics
Gunoh Lee,Seong Cheol Jang,Ju Hyeok Lee,Ji‐Min Park,Byeongil Noh,Hyuk Choi,Hyukmin Kweon,Do Hwan Kim,Hyun You Kim,Hyun‐Suk Kim,Kyung Jin Lee
DOI: https://doi.org/10.1002/adfm.202405530
IF: 19
2024-04-24
Advanced Functional Materials
Abstract:The demand for flexible and high‐performance devices is increasing with the development of flexible electronics. This study proposes a novel CVD‐processable polymer dielectric, Parylene‐OH, as a crucial alternative to brittle inorganic dielectrics. Parylene‐OH offers a high‐quality smooth film with high dielectric constant and photopatternability, positioning it as a promising choice for future flexible devices. The development of flexible and stretchable devices is crucial for realizing future electronics. In particular, for dielectric layer, conventional inorganic materials are limited by their brittle nature, while organic materials suffer from a low dielectric constant. Here, a novel intrinsically photopatternable high‐k Parylene‐based thin film (Parylene‐OH) is fabricated via a chemical vapor deposition process based on the Gorham method, which provides pin‐hole free, conformal polymeric film on any type of surface. Parylene‐OH can be photo‐patterned by UV crosslinking without further lithography processes and dielectric constant of Parylene‐OH increases from 6.05 to 7.53 after crosslinking, without degrading other parameters, making it comparable to conventional high‐k dielectric, Al2O3. Flexible In─Ga─Zn─O (IGZO) thin‐film transistors (TFTs) with patterned dielectric layers can withstand higher strain owing to the localized pattern of each unit. A CMOS inverter integrated with n‐type IGZO and p‐type Te TFTs is successfully fabricated. Parylene‐OH can be used in the future of state‐of‐the‐art flexible electronic devices.
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology