High-Power Impulse Magnetron Sputter-Deposited Chromium-Based Coatings for Corrosion Protection

Yen-Chun Liu,Shih-Nan Hsiao,Ying-Hung Chen,Ping-Yen Hsieh,Ju-Liang He

DOI: https://doi.org/10.3390/coatings13122101

IF: 3.236

2023-12-18

Coatings

Abstract:The use of high-power impulse magnetron sputtering (HIPIMS) to deposit chromium-based thin films on brass substrates for the purpose of corrosion-protective coating was investigated. By varying the process parameters (pulse frequency, pulse width and N2 flow rate) and structure design, including single-layer and multilayer structures, the obtained results revealed that the Cr-N films deposited through the use of HIPIMS exhibited higher film density and corrosion resistance compared to traditional direct-current magnetron sputtering. Based on the results of a field test using copper-accelerated acetic acid solution, the Cr-N film with a multilayered structure can further extend the time to corrosion onset. This is because the bottom layer in the multilayer structure can block structural defects in the layer above it, effectively reducing the penetration of corrosive agents into the substrate. The high bias voltage, coupled with increased temperature during deposition, led to a dezincification effect, resulting in the reduced adhesion of the film to the substrate and decreased overall corrosion resistance.

materials science, multidisciplinary,physics, applied, coatings & films

What problem does this paper attempt to address?

The paper primarily explores the use of High-Power Impulse Magnetron Sputtering (HIPIMS) technology to deposit chromium-based coatings to enhance the corrosion resistance of copper alloy materials. The study evaluates the density and corrosion resistance of Cr-N films under different conditions by varying process parameters (such as pulse frequency, pulse width, and nitrogen flow rate) and structural designs (including single-layer and multi-layer structures).

Specifically, the study found that:
- Cr-N films prepared using HIPIMS technology have higher film density and better corrosion resistance compared to those prepared using traditional Direct Current Magnetron Sputtering (DCMS).
- Multi-layer Cr-N films can further extend the time before corrosion begins because the bottom layers in the multi-layer structure can block defects in the upper layers, effectively reducing the penetration of corrosive substances into the substrate.
- During the deposition process, the de-zincing effect caused by high bias voltage and temperature reduces the adhesion between the film and the substrate, thereby decreasing the overall corrosion resistance.

Additionally, the paper discusses the advantages of HIPIMS technology in the deposition process, such as the ability to generate high ionization, high plasma density, and high ion energy, which contribute to obtaining dense and well-adhered coatings. The study employed electrochemical methods and long-term field tests (Copper Accelerated Acetic Acid Salt Spray Test) to evaluate the corrosion resistance of the coatings and used microstructural analysis to establish the relationship between coating performance and its structure. Experimental results show that samples with specific multi-layer structures can last for 8 hours in the test, demonstrating good corrosion protection; however, multi-layer coatings with high bias seed layers exhibit poorer corrosion resistance.