The Impact of Gate Recess on the H2 Detection Properties of Pt-AlGaN/GaN HEMT Sensors

Robert Sokolovskij,Jian Zhang,Hongze Zheng,Wenmao Li,Yang Jiang,Gaiying Yang,Hongyu Yu,Pasqualina M. Sarro,Guoqi Zhang
DOI: https://doi.org/10.1109/jsen.2020.2987061
IF: 4.3
2020-08-15
IEEE Sensors Journal
Abstract:The present work reports on the hydrogen gas detection properties of Pt-AlGaN/GaN high electron mobility transistor (HEMT) sensors with recessed gate structure. Devices with gate recess depths from 5 to 15 nm were fabricated using a precision cyclic etching method, examined with AFM, STEM and EDS, and tested towards H<sub>2</sub> response at high temperature. With increasing recess depth, the threshold voltage ( ${V}_{textit {TH}}$ ) shifted from −1.57 to 1.49 V. A shallow recess (5 nm) resulted in a 1.03 mA increase in signal variation ( $Delta {I}_{textit {DS}}$ ), while a deep recess (15 nm) resulted in the highest sensing response ( ${S}$ ) of 145.8% towards 300 ppm H<sub>2</sub> as compared to reference sensors without gate recess. Transient measurements demonstrated reversible H<sub>2</sub> response for all tested devices. The response and recovery time towards 250 ppm gradually decreased from 7.3 to 2.5 min and from 29.2 to 8.85 min going from 0 nm to 15 nm recess depth. The power consumption of the sensors reduced with increasing recess depth from 146.6 to 2.95 mW.
engineering, electrical & electronic,instruments & instrumentation,physics, applied
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