Review and Challenges of Photosensitive Materials in Two-Photon Lithography (Invited)
Yun Dong,Xiangming He,Hong Xu
DOI: https://doi.org/10.3788/cjl240602
2024-01-01
Chinese Journal of Lasers
Abstract:Significance Micro- or nano-scale materials often exhibit physical properties different from those of macroscopic materials, unlocking potential functional applications. The use of micro- and nanoscale structures and devices has become increasingly widespread in areas such as microelectronics, micro-optics, biomedicine, and metamaterials. Consequently, high-resolution and high-precision micro- and nanofabrication technologies must be developed to better understand material properties at the microscopic scale and facilitate the construction of functional devices. Current strategies for creating micro- and nanostructures in nanotechnology can be broadly categorized into bottom-up and top-down approaches. Bottom-up strategies include atomic layer deposition, sol-gel nanofabrication, molecular self-assembly, and physical/chemical vapor deposition. In contrast, top-down strategies include photolithography, electron beam lithography, two-photon lithography, nanoimprinting, laser sintering, and inkjet printing. Top-down strategies typically offer superior processing accuracy and resolution, enabling repeatable large-scale production. In top-down micro- and nanofabrication, techniques such as electron beam lithography, photolithography, and nanoimprinting, can perform micro- and nanofabrication; however, they often produce two-dimensional patterns in a single manufacturing step. The creation of three-dimensional structures requires multi-layer printing or the use of complex imprinting templates. Laser sintering and inkjet printing can process ceramic and metallic materials but cannot directly process bulk or solution materials. In contrast, two-photon lithography, with its unique two-photon absorption effect, offers high resolution and exceptional spatial selectivity, creating intricate three-dimensional structures within a photoresist film or solution. Nevertheless, the practical implementations of two-photon lithography encounter several challenges. First, femtosecond lasers are prohibitively expensive. Second, the spatial resolution and writing speed of two-photon lithography require further enhancement. Third, existing two-photon photoresists are limited and do not satisfy the demands of various applications. Furthermore, the photoresists significantly affect graphical resolution. Consequently, advancing two-photon lithography toward greater precision and broader application domains necessitates the development of two-photon photoresists and novel lithography mechanisms. Progress In contrast to single-photon lithography processes, this article first reviews the mechanisms of two-photon non-linear absorption and two-photon lithography. It elucidates the advantages of two-photon lithography in three-dimensional micro/nanofabrication. Because of the spatial focusing effect inherent in two-photon nonlinear absorption, two-photon lithography can achieve spatial resolution beyond the Rayleigh diffraction limit (Fig.3), which also exhibits superior spatial selectivity, enabling the construction of intricate three-dimensional structures within a singular lithographic iteration (Fig.4). Subsequently, an overview of structural design strategies for two-photon initiators is given. The representative photosensitive molecules of radical initiators (Fig.5) and cationic initiators (Fig.6) are also discussed, emphasizing their two-photon absorption characteristics. Based on structure-activity relationships, the conjugation strength in two-photon initiators can be enhanced by designing the quantity, spatial arrangement, and competence of electron-donating and electron-accepting segments, combined with designing the conjugation length and bridging configurations within the initiator molecules. Depending on the spatial arrangement of electron donors and acceptors, the molecular structural design and two-photon absorption performance are detailed for two categories of two-photon initiators, which include configurations such as D-pi-A, D-pi-D, and D-pi-A-pi-D types. Then, the reaction mechanisms and representative polymer two-photon photoresists, that is, radical polymerization/crosslinking photoresists and cationic polymerization photoresists, are summarized. The assortment of radical polymerization/crosslinking photoresists, encompassing acrylates (Fig.7), thiol-enes (Fig.8), and hydrogel photoresists, exhibits considerable diversity. In contrast, cationic polymerization photoresists predominantly comprise epoxy resin-based photoresists (Fig.15). Finally, the article encapsulates the material design and three-dimensional fabrication strategies for inorganic-organic hybrid photoresists, which are described as follows:1) The use of photocurable polymer frameworks facilitates the assembly of inorganic/metal three-dimensional constructs, although limited to the formation of hollow tubular architectures (Fig.17).2) The integration of ceramic particles or metal ions into polymer photoresists allows the embedding of ceramic/metal substances into the photocured polymer matrix, with subsequent ablation processes leading to the isolation of pure ceramic or metal constituents (Fig.19).3)Inorganic-organic hybrid photoresists, prepared by coordinating photopolymerizable monomers with metal salts or metal oxide nanoparticles, allow direct photopolymerization and improve resolution (Fig.23). However, this method requires more complex material preparation than the second strategy.4) Inspired by the third strategy, the organic ligands can be modified on the surface of quantum dot nanocrystals to prepare inorganic-organic hybrid photoresists. By exploiting the optoelectronic properties of quantum dot materials, this photoresist does not require initiators and exhibits self-assembly properties, demonstrating a new photoinduced chemical bonding strategy (Fig.27).5) Incorporating initiators and monomers into the porous structures of metal-organic frameworks allows the fabrication of intricate three-dimensional structures using two-photon lithography, expanding the range of materials available for two-photon lithography (Fig.30).6) Leveraging the reversible photoinduced structural changes of amorphous semiconductor materials enables direct photopolymerization without requiring initiators (Fig.31). Hence, inorganic-organic hybrid photoresists are promising for material design and fabrication strategies for three-dimensional structures, with each approach offering distinct advantages. Conclusions and Prospects Because two-photon lithography technology has resolutions beyond the diffraction limit and high spatial selectivity, they are advantageous for fabricating three-dimensional micro- and nano-structures. However, this technology has challenges related to the limited variety of processable photoresists and the limited resolution of photoresist materials. This article reviews the principles of two-photon lithography technology and the development stage of two-photon initiators, polymer photoresists, and inorganic-organic hybrid photoresists. The development of polymer photoresists is relatively mature, with important applications in the biomedical field. However, owing to the large size and broad size distribution of the polymer chains, they face limitations in high-resolution lithography. In contrast, inorganic-organic hybrid photoresists, capable of fabricating pure ceramic and metallic three-dimensional structures, have broader applications in micro- and nano-optics and metamaterials. In addition, the tiny size and narrow distribution of inorganic-organic hybrid nanocrystals help to achieve lithographic patterns with high resolution and low roughness. In addition, the diversity of inorganic-organic hybrids leads to various composite photoresist systems. It also facilitates the development of new lithographic mechanisms to achieve breakthroughs in photoresist materials. In the future, existing photoresist systems must be modified to meet the application requirements of more diverse fields and manufacture structures with smaller features. In addition, two-photon photoresists with better initiator system design, photoresist material design, and innovative lithographic mechanisms must be developed. This will improve the applicability of two-photon lithography to three-dimensional manufacturing in various fields