Intrinsically Thermally Degradable Microstructures Fabricated by Photodimerization in Rapid 3D Laser Printing

Steven C. Gauci,Paul Somers,Mohammed Aljuaid,Martin Wegener,Christopher Barner‐Kowollik,Hannes A. Houck
DOI: https://doi.org/10.1002/adfm.202414713
IF: 19
2024-11-22
Advanced Functional Materials
Abstract:A dissolve‐and‐go photoinitiator‐free resist based on thermoreversible monothiomaleimide [2 + 2] photo‐dimerization chemistry is introduced for twophoton laser printing. In addition to excelling in printing speeds, the new resist is compatible with irreversible commercial inks to generate hybrid multi‐materials. Moreover, the thermal reversibility of the [2 + 2] cycloaddition cross‐links enables intrinsic chemical degradability, simply upon heating the printed material. Classical photoresists utilized in direct laser writing (DLW) rely on photoinitiators and radical polymerization mechanisms to induce the cross‐linking process. Herein, a simple initiator‐free photoresist is introduced that enables the rapid fabrication of intrinsically thermally degradable 3D microstructures via DLW. The reported photoresist exploits the [2 + 2] photo‐dimerization reaction of a multifunctional monosubstituted thiomaleimide compound while harvesting on‐demand microstructure degradation through the intrinsic thermally reversible nature of the photocrosslinks. The photoresist exceeds attainable DLW printing speeds for non‐chain growth resins, readily attaining 1500 μm s−1 and up to 5000 μm s−1, making it a promising system to compete with traditional photo‐initiator containing resists while introducing on‐demand post‐printing degradability.
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
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