Lithography machine silicon wafer bench micro-motion workbench
成荣,朱煜,张鸣,刘召,杨开明,徐登峰,张利,田丽,叶伟楠,张金,尹文生,穆海华,胡金春,赵彦坡,秦慧超,胡清平
2013-01-01
Abstract:The invention relates to a lithography machine silicon wafer bench micro-motion workbench which is mainly used in a semiconductor lithography device. The workbench provided by the invention comprises a pedestal, a micro-motion workbench mover, a micro-motion workbench stator, four first-type Lorentz motors and four second-type Lorentz motors. The four first-type Lorentz motors are arranged on four edges of the micro-motion workbench and are symmetric about an original point. The four first-type Lorentz motors drive the micro-motion workbench to move along an X direction and along a Y direction, and to rotate around a Z axis. The four second-type Lorentz motors are respectively arranged on the X axis and the Y axis, and are symmetrically distributed on the outer sides of the four first-type Lorentz motors. The four second-type Lorentz motors drive the micro-motion workbench to move along a Z direction, to rotate around the X axis, and to rotate around the Y axis. Also, the micro-motion workbench comprises a gravity compensation mechanism with a closed magnetic circuit. Compared with prior art, the micro-motion workbench provided by the invention has the characteristics of less motor type, simple assembly, compact structure, centroid driving, low micro-motion workbench mover inertia, and the like.