Adhesion and debonding of multi-layer thin film structures

R.H. Dauskardt,M. Lane,Q. Ma,N. Krishna
DOI: https://doi.org/10.1016/s0013-7944(98)00052-6
IF: 5.4
1998-08-01
Engineering Fracture Mechanics
Abstract:A fracture mechanics technique to quantitatively measure the adhesion or interfacial fracture resistance of interfaces in thin film structures is described. Adhesion values obtained for the technologically important SiO2/TiN interface in microelectronic interconnect structures are related to a range of material, mechanical and design parameters which include interface morphology and adjacent ductile layer thickness. In addition, the interface was shown to be susceptible to environmentally-assisted subcritical debonding similar to stress corrosion cracking of SiO2 glass in moist air environments. Subcritical debonding behavior was sensitive to a range of material and design parameters, and is expected to have important implications for long term device reliability.
mechanics
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