Catalytic Non-Thermal MilliPulse Plasma for Methanation of CO2 without Carbon Deposition and Catalyst Deactivation

Baharak Sajjadi,Wei-Yin Chen
DOI: https://doi.org/10.1016/j.cej.2023.143428
IF: 15.1
2023-05-01
Chemical Engineering Journal
Abstract:Catalytic routes for upgrading CO2 through Sabatier reaction CO 2 + 4 H 2 → CH 4 + 2 H 2 O have been studied for decades. To avoid water adsorption and catalyst aging, the process must be operated at 300-400 °C, which subsequently causes carbon deposition and catalyst deactivation. Non-thermal plasma is a promising approach to overcoming the barriers associated with CO2 dissociation and conversion, and avoid the carbon deposition observed in a traditional Sabatier reaction. This study elucidated; 1) the impacts of reactor geometry and plasma condition on plasma discharge; 2) the synergism between active site (Ni and Co) and catalyst support; and 3) the impact of catalyst promoter (Ru) on CO2 conversion, methanation yield, and selectivity. The physics and chemistry of plasma were investigated in 6 different reactor geometries using 28 different catalysts. The plasma physics was discussed as a function of discharge characteristics, capacitance properties, reduced electric field, power consumption, and reactor temperature. CO2 conversion, CH4 yield, and CH4/(CO+ CH4) selectivity are reported and compared with those under thermo-catalysis at 400 °C. In addition, carbon deposition on the surface of high-voltage electrodes as a result of Joule heating was investigated. In contrast to γAl2O3, CO selectivity was dominant in SiO2-supported catalysts. In terms of active sites, the following trend was observed for CO2 conversion, methanation, and yield: Ru>Ni>Co. The addition of Ru promoter played a more prominent role in enhancing CH4/(CO+ CH4) selectivity, other than production yield or conversion. Except for SiO2-Ni15 and SiO2-Co15, all the catalysts showed a higher methane yield in plasma discharge at 150-170 °C than thermal conversion at 400 °C.
engineering, chemical, environmental
What problem does this paper attempt to address?