Microstructure and physical properties of black-aluminum antireflective films

Joris More-Chevalier,Cinthia Antunes Corrêa,Petr Hruska,Morgane Poupon,Michal Novotný,Peter Minárik,Pavel Hubík,František Lukáč,Ladislav Fekete,Dejan Prokop,Jan Hanuš,Jan Valenta,Přemysl Fitl,Ján Lančok
DOI: https://doi.org/10.2139/ssrn.4379199
IF: 4.036
2024-05-11
RSC Advances
Abstract:The microstructure and physical properties of reflective and black aluminum were compared for layers of different thicknesses deposited by magnetron sputtering on fused silica substrates. Reflective Al layers followed the Volmer–Weber growth mechanism classically observed for polycrystalline metal films. On the contrary, the extra nitrogen gas used to deposit the black aluminum layers modified the growth mechanism and changed the film morphologies. Nitrogen cumulated in the grain boundaries, favoring the pinning effect and stopping crystallite growth. High defect concentration, especially vacancies, led to strong columnar growth. Properties reported for black aluminum tend to be promising for sensors and emissivity applications.
chemistry, multidisciplinary
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