Synthesis and performance of TiN film electrode for supercapacitor by a facile chemical solution deposition method
Haiyun Tong,Zhaoxiaorong Nan,Hanlu Zhang,Bingbing Yang,Yingjie Liu,Peiqi Guo,Yiyong Wei,Zhenfa Zi,Xuebin Zhu
DOI: https://doi.org/10.1007/s10854-024-11939-4
2024-01-20
Journal of Materials Science Materials in Electronics
Abstract:Transition metal nitrides are recognized as an important electrode material for supercapacitors owing to their high corrosion resistance, good chemical and electrochemical stability, and electronic structure similar to transition metals. Here, we have successfully prepared the TiN thin films for supercapacitor electrodes without binder by means of a simple chemical solution deposition method. At a current density of 1 mA cm −2 in 0.5M H 2 SO 4 electrolyte, the resulting TiN thin film electrode achieves a high volumetric capacitance of 205.1 F cm −3 . In addition, a high energy density of 4.38 and 1.93 mWh cm −3 was achieved from the symmetric devices at a power density of 0.58 and 11.38 W cm −3 , respectively. After 4000 cycles, an excellent retention of 85.3% is achieved. This work demonstrates that the chemical solution deposition method can serve as a fast and large-scale production method for the production of metal nitride films that could be directly used as binder-free electrode materials for symmetric supercapacitors.
engineering, electrical & electronic,materials science, multidisciplinary,physics, condensed matter, applied