Abstract:Nickel (II) Oxide (NiO) is an emerging transparent semiconducting oxide with potential application in modern world ultraviolet active solar cells and visible-blind photodetectors. Despite of their critical importance, synthesis of device quality NiO thin films has remained a challenging issue. Inadequate research on growth kinetics leads to poor understanding of underlying science behind the modifications in the material properties of the grown films. Therefore, the present article reports an analysis of temperature-driven perturbations in the growth kinetics associated properties of NiO thin films grown via radio-frequency sputtering technique. The structural, morphological and optical properties of NiO films growth at various temperatures were probed and the obtained results were correlated thoroughly. It was observed that variation in growth temperature (30 – 500oC) alters the growth mechanism (Volmer-Weber to Stranski-Krastanov), surface features, stoichiometry, crystallite size, stress/strain as well as dislocation densities. The increment in Urbach energy at elevated temperatures indicated that the thermal excitation induced high adatoms mobility leading to poor crystallinity and high disorder. Interestingly, it was witnessed that NiO films growth at temperatures > 300oC exhibited stress relaxation via generation of higher defect states, lower surface roughness due to increased adatoms mobility and the suppression of first order Raman vibrational states (1PLO) associated with Ni-vacancies. Hence, we conclude that NiO films grown at 200 & 300oC possess superior material properties viz. largest crystallite size (∽ 20 nm), lower defects and high transmittance (> 90%) for device related applications.This article is protected by copyright. All rights reserved.

NiO thin films fabricated using spray-pyrolysis technique: structural and optical characterization and ultrafast charge dynamics studies

Structural and optical characterization of NiO polycrystalline thin films fabricated by spray-pyrolysis

Structural, morphological, optical and magnetic properties of sprayed NiO thin films by perfume atomizer

Preparation and Properties of NiO Films Via Sol-gel Process and Spin-coating

Deposition and Microstructural Characterization of NiO Thin Films by a Spray Pyrolysis Method

Fabrication of Li-Doped NiO Thin Films by Ultrasonic Spray Pyrolysis and Its Application in Light-Emitting Diodes

XPS study of NiO thin films obtained by chemical vapor deposition

Temperature‐Driven Perturbations in Growth Kinetics, Structural and Optical Properties of NiO Thin Films

Fabrication and characterization of NiO films for energetic nano-multilayers by direct current reactive sputtering

Fabrication of highly resistive NiO thin films for nanoelectronic applications

Effect of precursor concentration on stoichiometry and optical properties of spray pyrolyzed nanostructured NiO thin films

Investigation of the properties of nanostructured Li-doped NiO films using the modified spray pyrolysis method

Structural and optical properties on nickel oxide thin films prepared by simple nebulizer spray technique

Effect of Li doping on the structural, linear and nonlinear optical properties of NiO thin films

Unveiling the Influence of Dopants on Structural, Defect Chemistry, Morphological and Optical Characteristics of NiO Nanostructures

Investigating electrical properties and crystal growth in NiO thin films by spray pyrolysis and electrostatic spray deposition

Tailoring the optical performance of sprayed NiO nanostructured films through cobalt doping for optoelectronic device applications

Growth, Physical and Electrical Characterization of Nickel Oxide Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition Using Nickelocene and Oxygen Precursors

Preparation and Characterization of Highly Oriented NiO(200) Films by a Pulse Ultrasonic Spray Pyrolysis Method

Fabrication and characterization of NiO thin film by thermal oxidation method

Properties of the Highly Textured (200) NiO Thin Film Deposited by RF Magnetron Sputtering