Ultrafast thermalization dynamics in silicon wafer excited by femtosecond laser double-pulse vortex beam

Guangqing Du,Fangrui Yu,Ahmad Waqas,Feng Chen
DOI: https://doi.org/10.1016/j.optlastec.2024.110619
IF: 4.939
2024-01-22
Optics & Laser Technology
Abstract:The ultrafast thermalization dynamics of silicon wafers excited by a femtosecond laser double-pulse vortex beam was theoretically investigated via multi-physical fields simulations. A self-consistent model was developed, which comprehensively considers for the transient properties of optical, electronic and thermal parameters to predict the vortical thermalizations in silicon wafers. The spatial-temporal evolutions for carrier density and vortical temperature fields in nonequilibrium state of photo-excited silicon wafer are obtained in details. It is revealed that the photo-generated carrier can be significantly multiplied by utilizing a femtosecond laser double-pulse vortex beam, simultaneously amplifying the vortical thermalization dynamics of silicon wafer. The results can be attributed to two factors of the enhanced light absorption and the amplified carrier-phonon coupling dynamics via double-pulse vortex beam excitations. The results can provide for basic insights into the vortical heating dynamics of femtosecond laser double-pulse vortex beam interactions with semiconductors, putting forward the feasibility of advanced vortex beam applications for STED imaging, ultrafast SERS sensing and laser fabrication of sophisticated structures, etc.
optics,physics, applied
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