The comparison of the efficacy of 185/254 nm and 172 nm photolysis for the removal of sulfonamides and trimethoprim from aqueous solutions

Luca Farkas,Csaba Janáky,Tünde Alapi

DOI: https://doi.org/10.1016/j.jwpe.2024.105514

IF: 7

2024-05-29

Journal of Water Process Engineering

Abstract:The VUV (λ < 200 nm) photolysis can be used to eliminate organic substances without the addition of oxidant due to the efficient generation of OH from water. Two VUV light sources are commercially available: the low-pressure mercury vapor (LPM) and the Xe-excimer lamp, which emit 185/254 nm and 172 nm photons, respectively. This study compares the efficiency of the UV/VUV 185nm and VUV 172nm photolysis in removing four sulfonamides (SAs) and trimethoprim (TRIM) antibiotics. For the LPM lamp, 254 nm UV radiation ((4.21 ± 0.08) × 10 −6 mol photon s −1 ) can contribute to the transformation of target substances besides the OH generated by the 185 nm VUV light. The VUV photon flux (1.02 × 10 −5 mol photon s −1 ) of the Xe-excimer lamp significantly exceeded that of the LPM lamp (3.97 × 10 −7 mol photon s −1 ); as H 2 O 2 formation in pure water reflected, however, the efficiency of the transformation rate of the target substances was just slightly faster. For the LPM lamp, in addition to the direct UV photolysis of SAs, the 254 nm light enhances the OH formation via H 2 O 2 photolysis, thereby partially compensating for the low VUV 185nm photon flux. The high VUV 172nm photon flux was primarily manifested in mineralization efficiency and not in the transformation rate of target compounds. The short penetration depth of 172 nm light favors the recombination of primary radicals and decreases the efficiency. The effect of the matrix and matrix components is complex; they act as a radical scavenger or (V)UV filter. The change of radical set and the role of the formed secondary radicals (Cl, Cl 2 − , and CO 3 − ) in transformation must be considered.

engineering, chemical, environmental,water resources