Abstract:High-power impulse magnetron sputtering (HiPIMS) is a new magnetron sputtering technique which can produce high-density plasmas with a high ionization rate and prepare coatings with a good performance such as large density and high adhesion. To obtain stable discharge and universal materials' ionization rates, a cylindrical cathode is proposed based on the hollow cathode effect. However, the unusual plasma transport results in a large loss of ions and a low deposition rate. To solve these problems, an expanding electromagnetic field is proposed to control the plasma transport in this work. The particle in cell/Monte Carlo collision (PIC/MCC) method and the plasma diffusion model are used to simulate the plasma transport in and out of the cylindrical cathode with different currents in the electromagnetic coils, respectively. The simulation results reveal that different electromagnetic fields can achieve different plasma density distributions, resulting in different accumulated positions and different diffusion paths. When the coil current is positive, the resistance to axial motion of electrons is small but the resistance to radial motion is large, so that the hollow cathode effect is weakened and the plasma beam tends to output uniformly. When the coil current is negative, the resistance to axial motion of electrons is large but the resistance to radial motion is small, so that the hollow cathode effect is enhanced and the plasma tends to gather on the central axis and then diffuses outward. To verify the simulation results, Ar/Cr HiPIMS discharge experiments are carried out with the cylindrical cathode in a homemade vacuum system. The experiment results indicate that the threshold voltage, the plasma flow shape, the optical emission spectrum (OES) intensity, and the deposition distribution are determined by the electromagnetic coil current. The variation tendency is in coincidence with the prediction of the simulation. Consequently, by adding an expanding electromagnetic field, the plasma discharge in the cylindrical cathode can be easily controlled and the deposition rate is greatly enhanced. This electromagnetic control strategy not only realizes the enhancement and effective control of plasma, but also improves the homogeneity and the deposition rate of the coatings, thus laying a foundation for the industrial application of HiPIMS.

Energy distribution of negatively and positively charged ions in a magnetron sputtering discharge with a tungsten cathode and a positively biased anode in an argon/oxygen gas mixture.

Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium

Electron dynamics in radio frequency magnetron sputtering argon discharges with a dielectric target

A Pulsed Hollow Cathode Discharge Operated in an Ar/N /O Gas Mixture and the Formation of Nitric Oxide

Electron dynamics in planar radio frequency magnetron plasmas: II. Heating and energization mechanisms studied via a 2d3v particle-in-cell/Monte Carlo code

Experiments and kinetic modeling of the ion energy distribution function at the substrate surface during magnetron sputtering of silver targets in radio frequency argon plasmas

Control of ions energy distribution in dual-frequency magnetron sputtering discharges

On working gas rarefaction in high power impulse magnetron sputtering

Phasic Discharge Characteristics in High Power Pulsed Magnetron Sputtering

Plasma potential of a moving ionization zone in DC magnetron sputtering

Spectroscopic diagnosis and simulation analysis of tungsten cathode erosion during the start-up process for a magnetoplasmadynamic thruster

On double-layer and reverse discharge creation during long positive voltage pulses in a bipolar HiPIMS discharge

Ionized particle transport in reactive HiPIMS discharge: correlation between the energy distribution functions of neutral and ionized atoms

Modeling and Plasma Characteristics of High-Power Direct Current Discharge

Nano-second temporal particle behavior in high-power impulse magnetron sputtering discharge in a cylindrical cathode

Physics and technology of magnetron sputtering discharges

Electron dynamics and particle transport in capacitively coupled Ar/O2 discharges driven by sawtooth up voltage waveforms

Simulation Study on Plasma Discharge and Transport in Cylindrical Cathode Controlled by Expanding Electromagnetic Field

Azimuthal ion movement in HiPIMS plasmas -- Part I: velocity distribution function

Electron impact ionization differential cross sections of W+ in the distorted-wave Born approximation