Study of grain-patterned and highly ordered L10-FePt HAMR media using reactive molecular dynamics method

Jianxin Zhu,Jian-Ping Wang

DOI: https://doi.org/10.1063/9.0000762

IF: 1.697

2024-02-01

AIP Advances

Abstract:Embedded Mask Patterning (EMP) has been proposed as a cost-effective fabrication method to be capable of patterning sub-5-nm grain sizes for highly ordered L10-FePt media for Heat-Assisted Magnetic Recording (HAMR). Understanding the etching mechanism of FePt is critical to maintaining the highly ordered L10 structure and low damage to magnetic grains. In this research, a reactive Molecular Dynamics (MD) model is developed to study methanol (MeOH) plasma etching on highly ordered continuous L10-FePt media film. The model describes the reactive interaction mechanism between the plasma products CO/H2 molecules and Fe/Pt atoms. It shows the dominant Fe-C interaction upon the dissociation of CO ligands leads to formation of large and volatile Fen-C clusters contributing to high chemical etch yield.

materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology

What problem does this paper attempt to address?

The paper primarily investigates the method of using methanol (MeOH) plasma etching for highly ordered L10-FePt medium materials in Heat-Assisted Magnetic Recording (HAMR) technology. Specifically, the research team developed a Reactive Molecular Dynamics (rMD) model to simulate this process. The main issues the study attempts to address are as follows:

1. **Understanding the Etching Mechanism**: The research aims to deeply understand the reaction mechanisms between FePt materials and plasma products (such as CO and H2 molecules) during the methanol plasma etching process. This is crucial for maintaining the highly ordered structure of L10-FePt materials and reducing damage to magnetic particles.

2. **Formation of Fe-C Clusters**: The study found that on the Fe-terminated surface, the strong interaction between CO ligands and Fe atoms leads to the formation of large Fe_n-C clusters. These clusters are volatile and play a key role in enhancing the chemical etching yield.

3. **Comparison of Chemical Etching and Sputtering Yields**: By comparing the chemical etching yields of Fe-terminated and Pt-terminated surfaces, the study found that the chemical etching yield on the Fe-terminated surface is much higher than that on the Pt-terminated surface. Additionally, surfaces treated with methanol showed higher sputtering yields when subjected to Ar sputtering, possibly due to the surface treatment weakening the Fe-Pt bonds.

In summary, the goal of this study is to reveal the specific mechanisms of methanol plasma etching of L10-FePt medium materials during the Embedded Mask Patterning (EMP) process through molecular dynamics simulations, with the aim of optimizing the etching process to achieve finer nanoscale particle patterning.