Oxygen Vacancy Ordering: a Degree of Freedom That Can Control the Structural, Electronic and Magnetic Properties of Transition-Metal Oxide Films
M. Varela,J. Salafranca,N. Biskup,J. Gazquez,M. P. Oxley,V. Mehta,Y. Suzuki,S. Bose,M. Sharma,C. Leighton,W. Luo,S. T. Pantelides,S. J. Pennycook
DOI: https://doi.org/10.1017/s1431927614004504
IF: 4.0991
2014-01-01
Microscopy and Microanalysis
Abstract:1. Materials Science & Technology Div., Oak Ridge National Laboratory, Oak Ridge TN 37831, U.S.A. 2. Dept. de Física Aplicada III & Instituto Pluridisciplinar, Univ. Complutense, Madrid, 28040 Spain. 3. Instituto de Ciencia de Materiales de Barcelona, ICMAB-CSIC, Bellaterra, 08193 Spain. 4. Dept. of Physics & Astronomy, Vanderbilt University. Nashville, TN 37235, U.S.A. 5. Dept. of Material Science and Engineering, University of California, Berkeley, CA 94720, U.S.A. 6. Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, U.S.A. 7. Dept. of Applied Physics and Geballe Laboratory for Advanced Materials, Stanford University,Stanford, CA 94305, U.S.A. 8. Dept. of Chemical Eng. and Materials Science, Univ. of Minnesota, Minneapolis, MN 55455, U.S.A 9. Dept. of Electrical Eng. and Computer Science, Vanderbilt University, Nashville, TN 37235, U.S.A. 10. Dept. of Materials Science & Engineering, University of Tennessee, Knoxville TN 37996, U.S.A.