Abstract:Dielectric metasurfaces, composed of planar arrays of subwavelength dielectric structures that collectively mimic the operation of conventional bulk optical elements, have revolutionized the field of optics by their potential in constructing high-efficiency and multi-functional optoelectronic systems on chip. The performance of a dielectric metasurface is largely determined by its constituent material, which is highly desired to have a high refractive index, low optical loss and wide bandgap, and at the same time, be fabrication friendly. Here, we present a new material platform based on tantalum pentoxide (Ta 2 O 5 ) for implementing high-performance dielectric metasurface optics over the ultraviolet and visible spectral region. This wide-bandgap dielectric, exhibiting a high refractive index exceeding 2.1 and negligible extinction coefficient across a broad spectrum, can be easily deposited over large areas with good quality using straightforward physical vapor deposition, and patterned into high-aspect-ratio subwavelength nanostructures through commonly-available fluorine-gas-based reactive ion etching. We implement a series of high-efficiency ultraviolet and visible metasurfaces with representative light-field modulation functionalities including polarization-independent high-numerical-aperture lensing, spin-selective hologram projection, and vivid structural color generation, and the devices exhibit operational efficiencies up to 80%. Our work overcomes limitations faced by scalability of commonly-employed metasurface dielectrics and their operation into the visible and ultraviolet spectral range, and provides a novel route towards realization of high-performance, robust and foundry-manufacturable metasurface optics.

What problem does this paper attempt to address?

The main problem that this paper attempts to solve is to develop a new material platform - tantalum pentoxide (Ta₂O₅), for achieving high - performance dielectric metasurface optical devices in the ultraviolet and visible spectral regions. Specifically, the goals of the paper include: 1. **Overcoming the limitations of existing materials**: Existing dielectric metasurface materials (such as silicon, silicon nitride, titanium dioxide, etc.) have some limitations in applications in the ultraviolet and visible light regions, such as limited band - gap width, high optical loss, and difficulty in large - scale preparation. The paper proposes using tantalum pentoxide as a new material platform to overcome these limitations. 2. **Achieving high - efficiency optical functions**: By using tantalum pentoxide, the paper shows how to achieve a series of representative optical functions, including: - **Polarization - independent high - numerical - aperture lenses**: Ultraviolet metal lenses with different numerical apertures (NA) are designed. These lenses can achieve efficient focusing at a wavelength of 325 nm, and the experimentally measured focusing efficiency is as high as 65%. - **Spin - selective holographic projection**: Broadband ultraviolet and visible - light holograms based on geometric phase are realized. These holograms can work at wavelengths of 325 nm and 407 nm, and the experimentally measured hologram efficiencies are 75.9% and 37.3% respectively. - **Structural color generation**: By designing nanopillar arrays that support geometric Mie resonances, bright and highly pure reflective colors are generated throughout the visible - light region, and the experimentally measured peak efficiency is approximately 80%. 3. **Simplifying the preparation process**: The paper proposes a simple preparation method. Using physical vapor deposition (PVD) and fluorine - based reactive ion etching (RIE) processes, high - quality tantalum pentoxide thin films and high - aspect - ratio nanostructures can be prepared on a standard CMOS process line. This method not only improves the quality of the material but also reduces the preparation cost, making large - scale production possible. In summary, by introducing tantalum pentoxide as a new material platform, this paper aims to solve the limitations of existing dielectric metasurface materials in applications in the ultraviolet and visible - light regions and demonstrates its high - efficiency performance in multiple optical functions and the feasibility of the preparation process.

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