Synergistic Degradation of Durable Polymer Networks by Light and Acid Enabled by Pyrenylsilicon Crosslinks
Yutaro Kawano,Hiroshi Masai,Takuya Tsubokawa,Daisuke Yokogawa,Tomohiro Iwai,Jun Terao
DOI: https://doi.org/10.1002/adma.202412544
IF: 29.4
2024-12-04
Advanced Materials
Abstract:A significant advancement in resolving the incompatibility between photodegradablity and photostability of polymer materials is reported by developing a novel cleavage reaction of the C–Si bond under simultaneous exposure to light and acid. The synergistic activation of polymer materials can be applied to a wide range of materials, including color‐tunable optical materials, tough elastic materials, and additive/subtractive 3D‐photoprinting materials. Material photocontrol has gained importance in process engineering and biomedical applications. However, highly photoreactive materials are intrinsically unstable to light, which limits their continuous use in lit environments owing to their gradual deterioration. Herein, synergistically photocontrollable materials in the presence of acid are developed to overcome the conventional trade‐off between their photoreactivity and photostability. Pyrenylsilicon derivatives are designed as synergistically cleavable moieties on C–Si bonds under simultaneous treatment with light and acid through photoinduced dearomatization and protonation to generate the Wheland intermediate, whereas the derivatives are highly stable to light or acid alone. The unique reactivity of pyrenylsilicon derivatives is applied to various polymer network crosslinkers, enabling synergistic control and degradation of materials with light and acids. Because of their high photostability in the absence of acids, these materials can be utilized as optical materials, robust elastomers, and 3D photoprinted gels.
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology