Type-II band alignment AlN/InSe van der Waals heterostructure: Vertical strain and external electric field

Ru Zhang,Yan Zhang,Xing Wei,Tingting Guo,Jibin Fan,Lei Ni,Yijun Weng,Zhengdi Zha,Jian Liu,Ye Tian,Ting Li,Li Duan
DOI: https://doi.org/10.1016/j.apsusc.2020.146782
IF: 6.7
2020-10-01
Applied Surface Science
Abstract:<p>The electronic characteristics of the AlN/InSe van der Waals heterostructure (vdWH) were investigated via employing density functional theory calculations. The vdWH has an indirect band gap with a connatural interlaced-gap type-II band alignment, so the electrons and holes are able to spatially dwell in the InSe and AlN layer, respectively. Especially, the AlN/InSe vdWH owns a higher carrier mobility for both electrons and holes reaching up to 10<sup>3</sup> cm<sup>2</sup> V<sup>−1</sup> s<sup>−1</sup>. Additionally, the electronic properties of the vdWH can be adjusted by vertical strains as well as external electric fields. When imposing a moderate perpendicular electric field, the band gaps of the vdWH vary linearly. It brings a transformation from semiconductor to metal. This work demonstrates that the novel two-dimensional (2D) AlN/InSe vdWH is a vigorous nominee for optoelectronic and nanoelectronic applications.</p>
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films
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