MAGNETRON SPUTTERING SYNTHESIS OF ELECTROCATALYSTS

M.V. Kozlova,V.N. Fateev,O.K. Alekseeva,N.A. Ivanova,V.V. Tishkin,A.Sh. Aliyev,,,,,,,
DOI: https://doi.org/10.32737/2221-8688-2024-1-7-19
2024-01-01
Chemical Problems
Abstract:Magnetron sputtering is a well-known method of obtaining various coatings and surface modifications, but nowadays it is successfully used for the synthesis of electrocatalysts. One of the main advantages of the method is the possibility to vary the parameters during the process, such as the mode (direct current sputtering, pulsed medium-frequency sputtering, high radio frequency sputtering), potential supply to the sputtered substrate or catalyst carrier, pressure in the vacuum chamber, atmosphere composition, which allows to change the composition and structure of the obtained coatings and catalysts very widely. Changing the modes of sputtering makes it possible to create both dense (porous) protective/catalytic coatings and coatings with a very developed surface, i.e. for obtaining electrode materials
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