Abstract:The new EUV Lithography tools for IC High Volume Manufacture at 22nm make use of EUV radiation at \lambda = 13.5nm. High power Laser (LPP) and Discharge (DPP)EUV light sources are based on Sn plasmas for the optimum conversion of electrical power to in-band radiation. Sn-fueled sources emit debris such as Sn particles in a rather wide energy spectrum: from thermalized Sn to several tens keV fast ions. Tin interaction with the collector mirrors surfaces facing the high power EUV light source leads to the degradation of the optical performance and productivity of the litho tool, therefore debris must be suppressed and the surface modification of the mirror materials during the particle irradiation must be carefully investigated both theoretically and experimentally. For DPP Sn-fueled sources the collector is a grazing incidence mirror that reflects the EUV light in the grazing angle range from about 1\degree to 20\degree. The most used material for these collector mirrors is Ru. The knowledge of the interaction process of Sn particles at different energies and angles with Ru mirrors is crucial to understand mirror degradation and to tune the parameters of the source and of the debris suppression devices to reach optimal mirror lifetime. We carried out a study of the modification of the ruthenium surface exposed to the simultaneous flux of thermalized and energetic Sn at grazing incidence, for energies varying from 300eV to 30keV. The computational study is performed with the Monte Carlo codes TRIDYN and TRIM.SP based on binary collision approximation assumptions. These tools allow to follow dynamically and at steady state the evolution of the surface composition and to model surface binding energy and density for predicting sputtering, reflection, ion-assisted deposition and depth profiles in the nm surface region.

Mass-limited Sn target irradiated by dual laser pulses for an extreme ultraviolet lithography source.

Collimated Quasi-Monoenergetic Protons From Interaction Of Two Intersecting Lasers With Thin Double-Layer Target

Characterization of angularly resolved EUV emission from 2-$μ$m-wavelength laser-driven Sn plasmas using preformed liquid disk targets

A Laser-Produced Plasma Source Based on Thin-Film Gd Targets for Next-Generation Extreme Ultraviolet Lithography

Efficient extreme ultraviolet emission by multiple laser pulses

Ion distribution and ablation depth measurements of a fs-ps laser-irradiated solid tin target

In-situ, variable thickness, liquid crystal film target inserter for moderate repetition rate intense laser applications

Controlling ion kinetic energy distributions in laser produced plasma sources by means of a picosecond pulse pair

Modeling the hundreds-of-nanoseconds-long irradiation of tin droplets with a 2 extmu m-wavelength laser for future EUV lithography

Influence of CO2-laser pulse parameters on 13.5 nm extreme ultraviolet emission features from irradiated liquid tin target

Physics of laser-driven tin plasma sources of EUV radiation for nanolithography

Identification of HLA-A 3-restricted Cytotoxic T Lymphocyte Epitopes from Carcinoembryonic Antigen and HER-2 / neu by Primary in Vitro Immunization with Peptide-pulsed Dendritic Cells 1

Laser-induced damage thresholds of ultrathin targets and their constrain on laser contrast in laser-driven ion acceleration experiments

Experimental Study on the Temporal Evolution Parameters of Laser–Produced Tin Plasma under Different Laser Pulse Energies for LPP–EUV Source

Measurements of ion fluxes in extreme ultraviolet-induced plasma of new EUV-beam-line 2 nanolithography research machine and their applications for optical component tests

Demonstration of a laser-driven, narrow spectral bandwidth x-ray source for collective x-ray scattering experiments

Spatial characterization of extreme ultraviolet plasmas generated by laser excitation of xenon gas targets

Laser-induced damage thresholds of ultrathin targets and their constraint on laser contrast in laser-driven ion acceleration experiments

Efficient multi-keV x-ray source generated by nanosecond laser pulse irradiated multi-layer thin foils target

Multilayer film coating for Laser Ion Source target for increase of low charge state production.

Grazing incidence interaction of Sn particles with EUV Lithography ruthenium mirrors